Approaches to Measure the Resistivity of Grain Boundaries in Metals with High Sensitivity and Spatial Resolution: A Case Study Employing Cu.
Journal
ACS applied electronic materials
ISSN: 2637-6113
Titre abrégé: ACS Appl Electron Mater
Pays: United States
ID NLM: 101734996
Informations de publication
Date de publication:
28 Jul 2020
28 Jul 2020
Historique:
received:
18
04
2020
accepted:
01
07
2020
entrez:
4
8
2020
pubmed:
4
8
2020
medline:
4
8
2020
Statut:
ppublish
Résumé
It is well-known that grain boundaries (GBs) increase the electrical resistivity of metals due to their enhanced electron scattering. The resistivity values of GBs are determined by their atomic structure; therefore, assessing the local resistivity of GBs is highly significant for understanding structure-property relationships. So far, the local electrical characterization of an individual GB has not received much attention, mainly due to the limited accuracy of the applied techniques, which were not sensitive enough to detect the subtle differences in electrical resistivity values of highly symmetric GBs. Here, we introduce a detailed methodology to probe
Identifiants
pubmed: 32743558
doi: 10.1021/acsaelm.0c00311
pmc: PMC7392200
doi:
Types de publication
Journal Article
Langues
eng
Pagination
2049-2056Informations de copyright
Copyright © 2020 American Chemical Society.
Déclaration de conflit d'intérêts
The authors declare no competing financial interest.
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