Bound Hole States Associated to Individual Vanadium Atoms Incorporated into Monolayer WSe_{2}.


Journal

Physical review letters
ISSN: 1079-7114
Titre abrégé: Phys Rev Lett
Pays: United States
ID NLM: 0401141

Informations de publication

Date de publication:
17 Jul 2020
Historique:
received: 19 12 2019
accepted: 09 06 2020
entrez: 4 8 2020
pubmed: 4 8 2020
medline: 4 8 2020
Statut: ppublish

Résumé

Doping a two-dimensional semiconductor with magnetic atoms is a possible route to induce magnetism in the material. We report on the atomic structure and electronic properties of monolayer WSe_{2} intentionally doped with vanadium atoms by means of scanning transmission electron microscopy and scanning tunneling microscopy and spectroscopy. Most of the V atoms incorporate at W sites. These V_{W} dopants are negatively charged, which induces a localized bound state located 140 meV above the valence band maximum. The overlap of the electronic potential of two charged V_{W} dopants generates additional in-gap states. Eventually, the negative charge may suppress the magnetic moment on the V_{W} dopants.

Identifiants

pubmed: 32745415
doi: 10.1103/PhysRevLett.125.036802
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

036802

Auteurs

Pierre Mallet (P)

Université Grenoble Alpes, Institut Neel, F-38042 Grenoble, France.
CNRS, Institut Neel, F-38042 Grenoble, France.

Florian Chiapello (F)

Université Grenoble Alpes, Institut Neel, F-38042 Grenoble, France.
CNRS, Institut Neel, F-38042 Grenoble, France.

Hanako Okuno (H)

Université Grenoble Alpes, CEA, IRIG-MEM, 38000 Grenoble, France.

Hervé Boukari (H)

Université Grenoble Alpes, Institut Neel, F-38042 Grenoble, France.
CNRS, Institut Neel, F-38042 Grenoble, France.

Matthieu Jamet (M)

Université Grenoble Alpes, CEA, CNRS, Grenoble INP, IRIG-SPINTEC, 38000 Grenoble, France.

Jean-Yves Veuillen (JY)

Université Grenoble Alpes, Institut Neel, F-38042 Grenoble, France.
CNRS, Institut Neel, F-38042 Grenoble, France.

Classifications MeSH