Prospects for microwave plasma synthesized N-graphene in secondary electron emission mitigation applications.


Journal

Scientific reports
ISSN: 2045-2322
Titre abrégé: Sci Rep
Pays: England
ID NLM: 101563288

Informations de publication

Date de publication:
03 Aug 2020
Historique:
received: 02 01 2020
accepted: 13 07 2020
entrez: 5 8 2020
pubmed: 5 8 2020
medline: 5 8 2020
Statut: epublish

Résumé

The ability to change the secondary electron emission properties of nitrogen-doped graphene (N-graphene) has been demonstrated. To this end, a novel microwave plasma-enabled scalable route for continuous and controllable fabrication of free-standing N-graphene sheets was developed. High-quality N-graphene with prescribed structural qualities was produced at a rate of 0.5 mg/min by tailoring the high energy density plasma environment. Up to 8% of nitrogen doping levels were achieved while keeping the oxygen content at residual amounts (~ 1%). The synthesis is accomplished via a single step, at atmospheric conditions, using ethanol/methane and ammonia/methylamine as carbon and nitrogen precursors. The type and level of doping is affected by the position where the N-precursor is injected in the plasma environment and by the type of precursors used. Importantly, N atoms incorporated predominantly in pyridinic/pyrrolic functional groups alter the performance of the collective electronic oscillations, i.e. plasmons, of graphene. For the first time it has been demonstrated that the synergistic effect between the electronic structure changes and the reduction of graphene π-plasmons caused by N doping, along with the peculiar "crumpled" morphology, leads to sub-unitary (< 1) secondary electron yields. N-graphene can be considered as a prospective low secondary electron emission and plasmonic material.

Identifiants

pubmed: 32747630
doi: 10.1038/s41598-020-69844-9
pii: 10.1038/s41598-020-69844-9
pmc: PMC7398926
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

13013

Subventions

Organisme : PEGASUS (Plasma Enabled and Graphene Allowed Synthesis of Unique nano-Structures) project, funded by the European Union's Horizon research and innovation program under grant agreement No 766894
ID : No 766894
Organisme : FCT - Fundação para a Ciência e a Tecnologia, through EAGER project (PTDC/NAN-MAT/30565/2017)
ID : PTDC/NAN-MAT/30565/2017

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Auteurs

N Bundaleska (N)

Instituto de Plasmas E Fusão Nuclear, Instituto Superior Técnico, Universidade de Lisboa, 1049, Lisbon, Portugal.

A Dias (A)

Instituto de Plasmas E Fusão Nuclear, Instituto Superior Técnico, Universidade de Lisboa, 1049, Lisbon, Portugal.

N Bundaleski (N)

CEFITEC, Departamento de Física, Faculdade de Ciências E Tecnologia, Universidade Nova de Lisboa, 2829-516, Lisbon, Portugal.

E Felizardo (E)

Instituto de Plasmas E Fusão Nuclear, Instituto Superior Técnico, Universidade de Lisboa, 1049, Lisbon, Portugal.

J Henriques (J)

Instituto de Plasmas E Fusão Nuclear, Instituto Superior Técnico, Universidade de Lisboa, 1049, Lisbon, Portugal.

D Tsyganov (D)

Instituto de Plasmas E Fusão Nuclear, Instituto Superior Técnico, Universidade de Lisboa, 1049, Lisbon, Portugal.

M Abrashev (M)

Faculty of Physics, Sofia University, 1164, Sofia, Bulgaria.

E Valcheva (E)

Faculty of Physics, Sofia University, 1164, Sofia, Bulgaria.

J Kissovski (J)

Faculty of Physics, Sofia University, 1164, Sofia, Bulgaria.

A M Ferraria (AM)

BSIRG, iBB, DEQ, Instituto Superior Técnico, Universidade de Lisboa, 1049-001, Lisbon, Portugal.

A M Botelho do Rego (AMB)

BSIRG, iBB, DEQ, Instituto Superior Técnico, Universidade de Lisboa, 1049-001, Lisbon, Portugal.

A Almeida (A)

Centre of Physics and Engineering of Advanced Materiais, Instituto Superior Técnico, Universidade de Lisboa, 1049-001, Lisbon, Portugal.

J Zavašnik (J)

Department of Gaseous Electronics F6, Jozef Stefan Institute, 1000, Ljubljana, Slovenia.

U Cvelbar (U)

Department of Gaseous Electronics F6, Jozef Stefan Institute, 1000, Ljubljana, Slovenia.

O M N D Teodoro (OMND)

CEFITEC, Departamento de Física, Faculdade de Ciências E Tecnologia, Universidade Nova de Lisboa, 2829-516, Lisbon, Portugal.

Th Strunskus (T)

Institute for Materials Science, Christian Albrechts Universitaet Zu Kiel, Kiel, Germany.

E Tatarova (E)

Instituto de Plasmas E Fusão Nuclear, Instituto Superior Técnico, Universidade de Lisboa, 1049, Lisbon, Portugal. elena.stefanova@tecnico.ulisboa.pt.

Classifications MeSH