Morphological and Elastic Transition of Polystyrene Adsorbed Layers on Silicon Oxide.

Adhesion SPM UFM elasticity physisorption polymers polystyrene silicon oxide

Journal

Journal of microscopy
ISSN: 1365-2818
Titre abrégé: J Microsc
Pays: England
ID NLM: 0204522

Informations de publication

Date de publication:
Dec 2020
Historique:
received: 27 03 2020
revised: 13 07 2020
accepted: 13 08 2020
pubmed: 17 8 2020
medline: 17 8 2020
entrez: 16 8 2020
Statut: ppublish

Résumé

Herein we present a study on the formation of irreversibly adsorbed layer of polystyrene molecules on silicon oxide surfaces. Various scanning probe microscopy techniques have been employed to study both the morphology and the mechanical properties of these self-assembled thin polymeric layers. More in detail, standard contact mode, force versus distance spectroscopy and ultrasonic force microscopy have been employed to obtain spatially-resolved maps and, thus, observe the physisorption of polystyrene on native silicon oxide substrate in function of time. Thick films, spin coated from a toluene solution, have been annealed at a temperature above the glass transition for increasing time intervals, and finally thoroughly rinsed in toluene. We have found that isolated islands of adsorbed chains are already present after an annealing time of half an hour. Prolonged annealing determines a progressive increase of the covered areas, whereas the formation of a complete flat layer requires 24 h. The pattern observed is in line with expected evolution of an unstable system, corresponding to the phenomenon of spinodal dewetting. Adhesion measurements show that the films present a reduced snap-off and the formation of a meniscus between tip and surface for annealing time up to 8 h. On the other hand, elastic measurements allow us to observe a progressive increase of the elastic modulus, with a complete transition for annealing time above 20 h. This is indication that a dense packing of the polystyrene molecules occurs, in line with the predictions of current models on the kinetics of irreversible adsorption. LAY DESCRIPTION: Herein we present a study on the formation of irreversibly adsorbed layer of polystyrene molecules on silicon oxide surfaces. Various scanning probe microscopy techniques have been employed to study both the morphology and the mechanical properties of these self-assembled thin polymeric layers. Thick polystyrene films, spin coated from a toluene solution, have been thermally annealed at a temperature above the glass transition for increasing time intervals, and finally thoroughly rinsed in toluene. We have found that isolated islands of adsorbed chains are already present after an annealing time of half an hour. Prolonged annealing determines a progressive increase of the covered areas, whereas the formation of a complete flat layer requires twenty-four hours. The adsorption pattern observed is in line with expected evolution of an unstable system, corresponding to the phenomenon of spinodal dewetting. Adhesion and elastic measurements have allowed us to observe a progressive increase of the packing density of the polystyrene molecules, in agreement with the predictions of current models on the kinetics of irreversible adsorption.

Identifiants

pubmed: 32797624
doi: 10.1111/jmi.12954
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

280-286

Subventions

Organisme : Action Concerté Recherche - ULB
ID : SADI
Organisme : Fonds de la Recherche Scientifique - FNRS
ID : EXOTICAGE

Informations de copyright

© 2020 Royal Microscopical Society.

Références

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Auteurs

F Dinelli (F)

CNR, Istituto Nazionale di Ottica (INO), Pisa, Italy.

P Pingue (P)

Laboratorio NEST - Scuola Normale Superiore, and Istituto Nanoscienze - CNR, Pisa, Italy.

G Signore (G)

Fondazione Pisana per la Scienza Onlus, Pisa, Italy.

S Napolitano (S)

Laboratory of Polymer and Soft Matter Dynamics, Experimental Soft Matter and Thermal Physics (EST), Faculté des Sciences, Université Libre de Bruxelles (ULB), Bruxelles, Belgium.

Classifications MeSH