Atomic-Scale Carving of Nanopores into a van der Waals Heterostructure with Slow Highly Charged Ions.
2D material modification
ion beam surface modification
monolayer precision
van der Waals heterostructure
Journal
ACS nano
ISSN: 1936-086X
Titre abrégé: ACS Nano
Pays: United States
ID NLM: 101313589
Informations de publication
Date de publication:
25 Aug 2020
25 Aug 2020
Historique:
pubmed:
19
8
2020
medline:
19
8
2020
entrez:
19
8
2020
Statut:
ppublish
Résumé
The growing family of 2D materials led not long ago to combining different 2D layers and building artificial systems in the form of van der Waals heterostructures. Tailoring of heterostructure properties postgrowth would greatly benefit from a modification technique with a monolayer precision. However, appropriate techniques for material modification with this precision are still missing. To achieve such control, slow highly charged ions appear ideal as they carry high amounts of potential energy, which is released rapidly upon ion neutralization at the position of the ion. The resulting potential energy deposition is thus limited to just a few atomic layers (in contrast to the kinetic energy deposition). Here, we irradiated a freestanding van der Waals MoS
Identifiants
pubmed: 32806047
doi: 10.1021/acsnano.0c04476
pmc: PMC7450701
doi:
Types de publication
Journal Article
Langues
eng
Sous-ensembles de citation
IM
Pagination
10536-10543Références
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