Compatibility of nonionic and anionic surfactants with persulfate activated by alkali in the abatement of chlorinated organic compounds in aqueous phase.

DNAPL Lindane wastes S-ISCO Nonionic and anionic surfactants Persulfate activated by alkali

Journal

The Science of the total environment
ISSN: 1879-1026
Titre abrégé: Sci Total Environ
Pays: Netherlands
ID NLM: 0330500

Informations de publication

Date de publication:
10 Jan 2021
Historique:
received: 10 06 2020
revised: 16 08 2020
accepted: 17 08 2020
pubmed: 4 9 2020
medline: 4 9 2020
entrez: 4 9 2020
Statut: ppublish

Résumé

Surfactant Enhanced In-Situ Chemical Oxidation (S-ISCO) is an emerging technology in the remediation of sites with residual Dense Non-Aqueous Phase Liquids (DNAPLs), a ubiquitous problem in the environment and a challenge to solve. In this work, three nonionic surfactants: E-Mulse3® (E3), Tween80 (T80), and a mixture of Tween80-Span80 (TS80), and an anionic surfactant: sodium dodecyl sulfate (SDS), combined with persulfate activated by alkali (PSA) as oxidant have been investigated to remove the DNAPL generated as liquid waste in lindane production, which is composed of 28 chlorinated organic compounds (COCs). Because the compatibility between surfactants and oxidants is a key aspect in the S-ISCO effectiveness the unproductive consumption of PS by surfactants was investigated in batch (up to 864 h) varying the initial concentration of PS (84-42 mmol·L

Identifiants

pubmed: 32882562
pii: S0048-9697(20)35311-0
doi: 10.1016/j.scitotenv.2020.141782
pii:
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

141782

Informations de copyright

Copyright © 2020 Elsevier B.V. All rights reserved.

Déclaration de conflit d'intérêts

Declaration of competing interest The authors declare that they have no known competing financial interests or personal relationships that could have appeared to influence the work reported in this paper.

Auteurs

Raul García-Cervilla (R)

Chemical Engineering and Materials Department, University Complutense of Madrid, Spain. Electronic address: raugar05@ucm.es.

Aurora Santos (A)

Chemical Engineering and Materials Department, University Complutense of Madrid, Spain. Electronic address: aursan@quim.ucm.es.

Arturo Romero (A)

Chemical Engineering and Materials Department, University Complutense of Madrid, Spain. Electronic address: aromeros@quim.ucm.es.

David Lorenzo (D)

Chemical Engineering and Materials Department, University Complutense of Madrid, Spain. Electronic address: dlorenzo@ucm.es.

Classifications MeSH