Kinetic Pathways of Block Copolymer Directed Self-Assembly: Insights from Efficient Continuum Modeling.

Onsager coefficients block copolymers computer simulation directed self-assembly kinetics metastable states morphology

Journal

ACS nano
ISSN: 1936-086X
Titre abrégé: ACS Nano
Pays: United States
ID NLM: 101313589

Informations de publication

Date de publication:
27 Oct 2020
Historique:
pubmed: 11 9 2020
medline: 11 9 2020
entrez: 10 9 2020
Statut: ppublish

Résumé

We introduce a computationally efficient continuum technique to simulate the complex kinetic pathways of block copolymer self-assembly. Subdiffusive chain dynamics is taken into account via nonlocal Onsager coefficients. An application to directed self-assembly of thin films of diblock copolymers on patterned substrates reveals the conditions under which experimentally observed metastable structures intervene in the desired thin-film morphology. The approach generalizes easily to multiblock copolymers and more complex guiding patterns on the substrate, and its efficiency allows for the systematic optimization of guiding patterns and process conditions.

Identifiants

pubmed: 32909745
doi: 10.1021/acsnano.0c06433
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

13986-13994

Auteurs

Jörg Rottler (J)

Department of Physics and Astronomy and Quantum Matter Institute, University of British Columbia, Vancouver, British Columbia V6T 1Z1, Canada.

Marcus Müller (M)

Institute for Theoretical Physics, Georg-August-Universität Göttingen, 37077 Göttingen, Germany.

Classifications MeSH