Kinetic Pathways of Block Copolymer Directed Self-Assembly: Insights from Efficient Continuum Modeling.
Onsager coefficients
block copolymers
computer simulation
directed self-assembly
kinetics
metastable states
morphology
Journal
ACS nano
ISSN: 1936-086X
Titre abrégé: ACS Nano
Pays: United States
ID NLM: 101313589
Informations de publication
Date de publication:
27 Oct 2020
27 Oct 2020
Historique:
pubmed:
11
9
2020
medline:
11
9
2020
entrez:
10
9
2020
Statut:
ppublish
Résumé
We introduce a computationally efficient continuum technique to simulate the complex kinetic pathways of block copolymer self-assembly. Subdiffusive chain dynamics is taken into account via nonlocal Onsager coefficients. An application to directed self-assembly of thin films of diblock copolymers on patterned substrates reveals the conditions under which experimentally observed metastable structures intervene in the desired thin-film morphology. The approach generalizes easily to multiblock copolymers and more complex guiding patterns on the substrate, and its efficiency allows for the systematic optimization of guiding patterns and process conditions.
Identifiants
pubmed: 32909745
doi: 10.1021/acsnano.0c06433
doi:
Types de publication
Journal Article
Langues
eng
Sous-ensembles de citation
IM