Interfacial tuning of chiral magnetic interactions for large topological Hall effects in LaMnO


Journal

Science advances
ISSN: 2375-2548
Titre abrégé: Sci Adv
Pays: United States
ID NLM: 101653440

Informations de publication

Date de publication:
Jul 2020
Historique:
received: 05 09 2019
accepted: 22 05 2020
entrez: 14 9 2020
pubmed: 15 9 2020
medline: 15 9 2020
Statut: epublish

Résumé

Chiral interactions in magnetic systems can give rise to rich physics manifested, for example, as nontrivial spin textures. The foremost interaction responsible for chiral magnetism is the Dzyaloshinskii-Moriya interaction (DMI), resulting from inversion symmetry breaking in the presence of strong spin-orbit coupling. However, the atomistic origin of DMIs and their relationship to emergent electrodynamic phenomena, such as topological Hall effect (THE), remain unclear. Here, we investigate the role of interfacial DMIs in 3

Identifiants

pubmed: 32923583
doi: 10.1126/sciadv.aaz3902
pii: aaz3902
pmc: PMC7455502
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

eaaz3902

Informations de copyright

Copyright © 2020 The Authors, some rights reserved; exclusive licensee American Association for the Advancement of Science. No claim to original U.S. Government Works. Distributed under a Creative Commons Attribution NonCommercial License 4.0 (CC BY-NC).

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Auteurs

Elizabeth Skoropata (E)

Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA.

John Nichols (J)

Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA.

Jong Mok Ok (JM)

Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA.

Rajesh V Chopdekar (RV)

Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA.

Eun Sang Choi (ES)

National High Field Magnet Laboratory, Florida State University, Tallahassee, FL 32310, USA.

Ankur Rastogi (A)

Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA.

Changhee Sohn (C)

Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA.

Xiang Gao (X)

Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA.

Sangmoon Yoon (S)

Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA.

Thomas Farmer (T)

Neutron Scattering Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA.

Ryan D Desautels (RD)

Neutron Scattering Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA.

Yongseong Choi (Y)

Advanced Photon Source, Argonne National Laboratory, Argonne, IL 60439, USA.

Daniel Haskel (D)

Advanced Photon Source, Argonne National Laboratory, Argonne, IL 60439, USA.

John W Freeland (JW)

Advanced Photon Source, Argonne National Laboratory, Argonne, IL 60439, USA.

Satoshi Okamoto (S)

Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA.

Matthew Brahlek (M)

Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA.

Ho Nyung Lee (HN)

Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA.

Classifications MeSH