Direct MOCVD Growth of Iron Oxide on Three-Dimensional Nickel Foam as Electrode for the Oxygen Evolution Reaction.
MOCVD
iron oxide
sustainable chemistry
thin films
water splitting
Journal
ChemSusChem
ISSN: 1864-564X
Titre abrégé: ChemSusChem
Pays: Germany
ID NLM: 101319536
Informations de publication
Date de publication:
20 Nov 2020
20 Nov 2020
Historique:
received:
07
08
2020
revised:
10
09
2020
pubmed:
15
9
2020
medline:
15
9
2020
entrez:
14
9
2020
Statut:
ppublish
Résumé
Iron oxide thin films were grown directly on three-dimensional nickel foam via metalorganic chemical vapor deposition (MOCVD) in the temperature range of 250-450 °C using Fe(CO)
Identifiants
pubmed: 32926764
doi: 10.1002/cssc.202001896
pmc: PMC7756718
doi:
Types de publication
Journal Article
Langues
eng
Sous-ensembles de citation
IM
Pagination
5954-5961Subventions
Organisme : "Programm zur Förderung des exzellenten wissenschaftlichen Nachwuchses"
Organisme : DFG
ID : RI_00313
Informations de copyright
© 2020 The Authors. Published by Wiley-VCH GmbH.
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