Oxide-Free Three-Dimensional Germanium/Silicon Core-Shell Metalattice Made by High-Pressure Confined Chemical Vapor Deposition.

chemical passivation core−shell structure high-pressure deposition interconnected polycrystalline Ge oxide-free Ge silica nanoparticle template three-dimensional nanostructure

Journal

ACS nano
ISSN: 1936-086X
Titre abrégé: ACS Nano
Pays: United States
ID NLM: 101313589

Informations de publication

Date de publication:
27 Oct 2020
Historique:
pubmed: 18 9 2020
medline: 18 9 2020
entrez: 17 9 2020
Statut: ppublish

Résumé

Metalattices are crystalline arrays of uniform particles in which the period of the crystal is close to some characteristic physical length scale of the material. Here, we explore the synthesis and properties of a germanium metalattice in which the ∼70 nm periodicity of a silica colloidal crystal template is close to the ∼24 nm Bohr exciton radius of the nanocrystalline Ge replica. The problem of Ge surface oxidation can be significant when exploring quantum confinement effects or designing electronically coupled nanostructures because of the high surface area to volume ratio at the nanoscale. To eliminate surface oxidation, we developed a core-shell synthesis in which the Ge metalattice is protected by an oxide-free Si interfacial layer, and we explore its properties by transmission electron microscopy (TEM), Raman spectroscopy, and electron energy loss spectroscopy (EELS). The interstices of a colloidal crystal film grown from 69 nm diameter spherical silica particles were filled with polycrystalline Ge by high-pressure confined chemical vapor deposition (HPcCVD) from GeH

Identifiants

pubmed: 32941002
doi: 10.1021/acsnano.0c03559
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

12810-12818

Auteurs

Pratibha Mahale (P)

Department of Chemistry, University of Pennsylvania, Philadelphia, Pennsylvania 19104, United States.

Parivash Moradifar (P)

Department of Material Science and Engineering & Material Research Institute, The Pennsylvania State University, University Park, Pennsylvania 16802, United States.

Hiu Yan Cheng (HY)

Department of Chemistry, The Pennsylvania State University, University Park, Pennsylvania 16802, United States.

Nabila Nabi Nova (NN)

Department of Chemistry, The Pennsylvania State University, University Park, Pennsylvania 16802, United States.

Alex J Grede (AJ)

Department of Electrical Engineering, The Pennsylvania State University, University Park, Pennsylvania 16802, United States.

Byeongdu Lee (B)

Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439, United States.

Luis R De Jesús (LR)

Department of Chemistry, University of Pennsylvania, Philadelphia, Pennsylvania 19104, United States.

Maxwell Wetherington (M)

Material Research Institute, The Pennsylvania State University, University Park, Pennsylvania 16802, United States.

Noel C Giebink (NC)

Department of Electrical Engineering, The Pennsylvania State University, University Park, Pennsylvania 16802, United States.

John V Badding (JV)

Department of Material Science and Engineering & Material Research Institute, The Pennsylvania State University, University Park, Pennsylvania 16802, United States.
Department of Chemistry, The Pennsylvania State University, University Park, Pennsylvania 16802, United States.

Nasim Alem (N)

Department of Material Science and Engineering & Material Research Institute, The Pennsylvania State University, University Park, Pennsylvania 16802, United States.

Thomas E Mallouk (TE)

Department of Chemistry, University of Pennsylvania, Philadelphia, Pennsylvania 19104, United States.

Classifications MeSH