Decreasing Interface Defect Densities via Silicon Oxide Passivation at Temperatures Below 450 °C.

ALD defect level passivation photodiode silicon oxidation

Journal

ACS applied materials & interfaces
ISSN: 1944-8252
Titre abrégé: ACS Appl Mater Interfaces
Pays: United States
ID NLM: 101504991

Informations de publication

Date de publication:
14 Oct 2020
Historique:
pubmed: 23 9 2020
medline: 23 9 2020
entrez: 22 9 2020
Statut: ppublish

Résumé

Low-temperature (LT) passivation methods (<450 °C) for decreasing defect densities in the material combination of silica (SiO

Identifiants

DOI: 10.1021/acsami.0c12636 PMID: 32960564
pubmed: 32960564
doi: 10.1021/acsami.0c12636
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

46933-46941

Auteurs

Zahra Jahanshah Rad (ZJ)

Department of Physics and Astronomy, University of Turku, FI-20014 Turku, Finland.

Juha-Pekka Lehtiö (JP)

Department of Physics and Astronomy, University of Turku, FI-20014 Turku, Finland.

Iris Mack (I)

Department of Electronics and Nanoengineering, Aalto University, FI-02150 Espoo, Finland.

Kawa Rosta (K)

Department of Electronics and Nanoengineering, Aalto University, FI-02150 Espoo, Finland.

Kexun Chen (K)

Department of Electronics and Nanoengineering, Aalto University, FI-02150 Espoo, Finland.

Ville Vähänissi (V)

Department of Electronics and Nanoengineering, Aalto University, FI-02150 Espoo, Finland.

Marko Punkkinen (M)

Department of Physics and Astronomy, University of Turku, FI-20014 Turku, Finland.

Risto Punkkinen (R)

Department of Future Technologies, University of Turku, FI-20014 Turku, Finland.

Hannu-Pekka Hedman (HP)

Department of Future Technologies, University of Turku, FI-20014 Turku, Finland.

Andrei Pavlov (A)

Department of Physics and Astronomy, University of Turku, FI-20014 Turku, Finland.

Mikhail Kuzmin (M)

Department of Physics and Astronomy, University of Turku, FI-20014 Turku, Finland.
Ioffe Physical-Technical Institute, Russian Academy of Sciences, St. Petersburg 194021, Russian Federation.

Hele Savin (H)

Department of Electronics and Nanoengineering, Aalto University, FI-02150 Espoo, Finland.
ORCID: 0000-0003-3946-7727

Pekka Laukkanen (P)

Department of Physics and Astronomy, University of Turku, FI-20014 Turku, Finland.
ORCID: 0000-0003-4220-985X

Kalevi Kokko (K)

Department of Physics and Astronomy, University of Turku, FI-20014 Turku, Finland.

Classifications MeSH