Effects of ultra-high-pressure annealing on characteristics of vacancies in Mg-implanted GaN studied using a monoenergetic positron beam.
Journal
Scientific reports
ISSN: 2045-2322
Titre abrégé: Sci Rep
Pays: England
ID NLM: 101563288
Informations de publication
Date de publication:
15 Oct 2020
15 Oct 2020
Historique:
received:
26
06
2020
accepted:
28
09
2020
entrez:
16
10
2020
pubmed:
17
10
2020
medline:
17
10
2020
Statut:
epublish
Résumé
Vacancy-type defects in Mg-implanted GaN were probed by using a monoenergetic positron beam. Mg ions were implanted into GaN to obtain 0.3-μm-deep box profiles with Mg concentrations of 1 × 10
Identifiants
pubmed: 33060712
doi: 10.1038/s41598-020-74362-9
pii: 10.1038/s41598-020-74362-9
pmc: PMC7562725
doi:
Types de publication
Journal Article
Langues
eng
Sous-ensembles de citation
IM
Pagination
17349Subventions
Organisme : Research and development of next-generation semiconductor to realize energy-saving society
ID : JPJ005357
Organisme : Polish National Science Centre through project
ID : 2018/29/B/ST5/00338
Références
Phys Rev Lett. 2012 Apr 13;108(15):156403
pubmed: 22587269
J Phys Condens Matter. 2019 Nov 27;31(47):475401
pubmed: 31429422