Automated Nanoscale Absolute Accuracy Alignment System for Transfer Printing.
Journal
ACS applied nano materials
ISSN: 2574-0970
Titre abrégé: ACS Appl Nano Mater
Pays: United States
ID NLM: 101726750
Informations de publication
Date de publication:
23 Oct 2020
23 Oct 2020
Historique:
received:
17
08
2020
accepted:
23
09
2020
entrez:
2
11
2020
pubmed:
3
11
2020
medline:
3
11
2020
Statut:
ppublish
Résumé
The heterogeneous integration of micro- and nanoscale devices with on-chip circuits and waveguide platforms is a key enabling technology, with wide-ranging applications in areas including telecommunications, quantum information processing, and sensing. Pick and place integration with absolute positional accuracy at the nanoscale has been previously demonstrated for single proof-of-principle devices. However, to enable scaling of this technology for realization of multielement systems or high throughput manufacturing, the integration process must be compatible with automation while retaining nanoscale accuracy. In this work, an automated transfer printing process is realized by using a simple optical microscope, computer vision, and high accuracy translational stage system. Automatic alignment using a cross-correlation image processing method demonstrates absolute positional accuracy of transfer with an average offset of <40 nm (3σ < 390 nm) for serial device integration of both thin film silicon membranes and single nanowire devices. Parallel transfer of devices across a 2 × 2 mm
Identifiants
pubmed: 33134883
doi: 10.1021/acsanm.0c02224
pmc: PMC7590505
doi:
Types de publication
Journal Article
Langues
eng
Pagination
10326-10332Déclaration de conflit d'intérêts
The authors declare no competing financial interest.
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