Automated Nanoscale Absolute Accuracy Alignment System for Transfer Printing.


Journal

ACS applied nano materials
ISSN: 2574-0970
Titre abrégé: ACS Appl Nano Mater
Pays: United States
ID NLM: 101726750

Informations de publication

Date de publication:
23 Oct 2020
Historique:
received: 17 08 2020
accepted: 23 09 2020
entrez: 2 11 2020
pubmed: 3 11 2020
medline: 3 11 2020
Statut: ppublish

Résumé

The heterogeneous integration of micro- and nanoscale devices with on-chip circuits and waveguide platforms is a key enabling technology, with wide-ranging applications in areas including telecommunications, quantum information processing, and sensing. Pick and place integration with absolute positional accuracy at the nanoscale has been previously demonstrated for single proof-of-principle devices. However, to enable scaling of this technology for realization of multielement systems or high throughput manufacturing, the integration process must be compatible with automation while retaining nanoscale accuracy. In this work, an automated transfer printing process is realized by using a simple optical microscope, computer vision, and high accuracy translational stage system. Automatic alignment using a cross-correlation image processing method demonstrates absolute positional accuracy of transfer with an average offset of <40 nm (3σ < 390 nm) for serial device integration of both thin film silicon membranes and single nanowire devices. Parallel transfer of devices across a 2 × 2 mm

Identifiants

pubmed: 33134883
doi: 10.1021/acsanm.0c02224
pmc: PMC7590505
doi:

Types de publication

Journal Article

Langues

eng

Pagination

10326-10332

Déclaration de conflit d'intérêts

The authors declare no competing financial interest.

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Auteurs

John McPhillimy (J)

Institute of Photonics, SUPA Department of Physics, University of Strathclyde, Glasgow, United Kingdom.
School of Engineering, University of Glasgow, Glasgow, United Kingdom.

Dimitars Jevtics (D)

Institute of Photonics, SUPA Department of Physics, University of Strathclyde, Glasgow, United Kingdom.

Benoit J E Guilhabert (BJE)

Institute of Photonics, SUPA Department of Physics, University of Strathclyde, Glasgow, United Kingdom.

Charalambos Klitis (C)

School of Engineering, University of Glasgow, Glasgow, United Kingdom.

Antonio Hurtado (A)

Institute of Photonics, SUPA Department of Physics, University of Strathclyde, Glasgow, United Kingdom.

Marc Sorel (M)

School of Engineering, University of Glasgow, Glasgow, United Kingdom.

Martin D Dawson (MD)

Institute of Photonics, SUPA Department of Physics, University of Strathclyde, Glasgow, United Kingdom.

Michael J Strain (MJ)

Institute of Photonics, SUPA Department of Physics, University of Strathclyde, Glasgow, United Kingdom.

Classifications MeSH