Experimental quantification of atomically-resolved HAADF-STEM images using EDX.
Compositional mappings
HAADF-STEM
Quantification
Semiconductors
Strain-state analysis
Journal
Ultramicroscopy
ISSN: 1879-2723
Titre abrégé: Ultramicroscopy
Pays: Netherlands
ID NLM: 7513702
Informations de publication
Date de publication:
Jan 2021
Jan 2021
Historique:
received:
27
07
2020
revised:
15
10
2020
accepted:
22
10
2020
pubmed:
4
11
2020
medline:
4
11
2020
entrez:
3
11
2020
Statut:
ppublish
Résumé
Atomically-resolved mappings of the indium composition in InGaN/GaN multi-quantum well structures have been obtained by quantifying the contrast in HAADF-STEM. The quantification procedure presented here does not rely on computation-intensive simulations, but rather uses EDX measurements to calibrate the HAADF-STEM contrast. The histogram of indium compositions obtained from the mapping provides unique insights into the growth of InGaN: the transition from GaN to InGaN and vice versa occurs in discreet increments of composition; each increment corresponds to one monolayer of the interface, indicating that nucleation takes longer than the lateral growth of the step. Strain-state analysis is also performed by applying Peak-Pair Analysis to the positions of the atomic columns identified the quantification of the contrast. The strain mappings yield an estimate of the composition in good agreement with the one obtained from quantified HAADF-STEM, albeit with a lower precision. Possible improvements to increase the precision of the strain mappings are discussed, opening potential pathways for the quantification of arbitrary quaternary alloys at atomic scales.
Identifiants
pubmed: 33142196
pii: S0304-3991(20)30298-9
doi: 10.1016/j.ultramic.2020.113152
pii:
doi:
Types de publication
Journal Article
Langues
eng
Sous-ensembles de citation
IM
Pagination
113152Informations de copyright
Copyright © 2020 Elsevier B.V. All rights reserved.