Band gap measurement by nano-beam STEM with small off-axis angle transmission electron energy loss spectroscopy (TEELS).

Dielectric function Nano-beam STEM Off-axis EELS Optical band gap Reflection EELS Transmission electron energy loss spectroscopy (TEELS) Valence band excitation

Journal

Ultramicroscopy
ISSN: 1879-2723
Titre abrégé: Ultramicroscopy
Pays: Netherlands
ID NLM: 7513702

Informations de publication

Date de publication:
Jan 2021
Historique:
received: 30 01 2020
revised: 24 10 2020
accepted: 01 11 2020
pubmed: 14 11 2020
medline: 14 11 2020
entrez: 13 11 2020
Statut: ppublish

Résumé

An energy band gap measurement method based on nano-beam STEM with small off-axis angle valence band transmission electron energy loss spectroscopy (TEELS) is reported. The effect of multiple scattering event is removed by self-convolution method to obtain a single scattering loss function and a dielectric function is calculated from the single scattering valence band energy loss function through Kramers-Kronig (K-K) analysis. Optical band gaps are extracted from energy loss spectra and the imaginary part of the dielectric functions for crystalline and amorphous SiO

Identifiants

pubmed: 33186852
pii: S0304-3991(20)30307-7
doi: 10.1016/j.ultramic.2020.113164
pii:
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

113164

Informations de copyright

Copyright © 2020 Elsevier B.V. All rights reserved.

Auteurs

Yun-Yu Wang (YY)

Micron Technology, 8000 S. Federal Way, Boise, ID 83716, USA. Electronic address: Yunyuwang@micron.com.

Qiang Jin (Q)

Micron Technology, 8000 S. Federal Way, Boise, ID 83716, USA.

Kent Zhuang (K)

Micron Technology, 8000 S. Federal Way, Boise, ID 83716, USA.

Jae Kyu Choi (JK)

Micron Technology, 8000 S. Federal Way, Boise, ID 83716, USA.

Jochonia Nxumalo (J)

Micron Technology, 8000 S. Federal Way, Boise, ID 83716, USA.

Classifications MeSH