Synthesis of Silyl Aluminum Reagents: Relevance Toward Atomic Layer Deposition of Metal Silicides and the Serendipitous Synthesis of a Novel Al-Hydride Cluster.

Journal

Inorganic chemistry
ISSN: 1520-510X
Titre abrégé: Inorg Chem
Pays: United States
ID NLM: 0366543

Informations de publication

Date de publication:
07 Dec 2020
Historique:
pubmed: 25 11 2020
medline: 25 11 2020
entrez: 24 11 2020
Statut: ppublish

Résumé

The novel mono-silyl [(R

Identifiants

DOI: 10.1021/acs.inorgchem.0c02730 PMID: 33232134
pubmed: 33232134
doi: 10.1021/acs.inorgchem.0c02730
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

17488-17496

Auteurs

Roman Bashkurov (R)

Schulich Faculty of Chemistry, Technion-Israel Institute of Technology, Haifa 32000, Israel.
ORCID: 0000-0002-8549-7989

Yosi Kratish (Y)

Schulich Faculty of Chemistry, Technion-Israel Institute of Technology, Haifa 32000, Israel.

Charles C Mokhtarzadeh (CC)

Intel Corporation, 2501 NE Century Boulevard, Hillsboro, Oregon 97124, United States.

Natalia Fridman (N)

Schulich Faculty of Chemistry, Technion-Israel Institute of Technology, Haifa 32000, Israel.

Dmitry Bravo-Zhivotovskii (D)

Schulich Faculty of Chemistry, Technion-Israel Institute of Technology, Haifa 32000, Israel.

Patricio E Romero (PE)

Intel Corporation, 2501 NE Century Boulevard, Hillsboro, Oregon 97124, United States.
Pontificia Universidad Católica de Chile, Escula de Ingenieria, Vicuna Mackenna 4860, Macul, Santiago, Chile.

Scott B Clendenning (SB)

Intel Corporation, 2501 NE Century Boulevard, Hillsboro, Oregon 97124, United States.

Yitzhak Apeloig (Y)

Schulich Faculty of Chemistry, Technion-Israel Institute of Technology, Haifa 32000, Israel.
ORCID: 0000-0002-1923-9236

Classifications MeSH