Investigation of silicon nanoparticles produced by centrifuge chemical vapor deposition for applications in therapy and diagnostics.


Journal

European journal of pharmaceutics and biopharmaceutics : official journal of Arbeitsgemeinschaft fur Pharmazeutische Verfahrenstechnik e.V
ISSN: 1873-3441
Titre abrégé: Eur J Pharm Biopharm
Pays: Netherlands
ID NLM: 9109778

Informations de publication

Date de publication:
Jan 2021
Historique:
received: 03 05 2020
revised: 23 10 2020
accepted: 27 11 2020
pubmed: 7 12 2020
medline: 21 9 2021
entrez: 6 12 2020
Statut: ppublish

Résumé

Porous silicon (PSi) is a biocompatible and biodegradable material, which can be utilized in biomedical applications. It has several favorable properties, which makes it an excellent material for building engineered nanosystems for drug delivery and diagnostic purposes. One significant hurdle for commercial applications of PSi is the lack of industrial scale production of nanosized PSi particles. Here, we report a novel two-step production method for PSi nanoparticles. The method is based on centrifuge chemical vapor deposition (cCVD) of elemental silicon in an industrial scale reactor followed by electrochemical post-processing to porous particles. Physical properties, biocompatibility and in vivo biodistribution of the cCVD produced nanoparticles were investigated and compared to PSi nanoparticles conventionally produced from silicon wafers by pulse electrochemical etching. Our results demonstrate that the cCVD production provides PSi nanoparticles with comparable physical and biological quality to the conventional method. This method may circumvent several limitations of the conventional method such as the requirements for high purity monocrystalline silicon substrates as starting material and the material losses during the top-down milling process of the pulse-etched films to porous nanoparticles. However, the electroless etching required for the porosification of cCVD-produced nanoparticles limited control over the pore size, but is amenable for scaling of the production to industrial requirements.

Identifiants

pubmed: 33279602
pii: S0939-6411(20)30355-6
doi: 10.1016/j.ejpb.2020.11.022
pii:
doi:

Substances chimiques

Drug Carriers 0
Indium Radioisotopes 0
Radiopharmaceuticals 0
Indium-111 E9NGC49E0T
Silicon Z4152N8IUI

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

254-265

Informations de copyright

Copyright © 2020 The Author(s). Published by Elsevier B.V. All rights reserved.

Auteurs

Dave Lumen (D)

Department of Chemistry, Radiochemistry, University of Helsinki, FI-00014 Helsinki, Finland.

Shiqi Wang (S)

Drug Research Program, Division of Pharmaceutical Chemistry and Technology, Faculty of Pharmacy, University of Helsinki, FI-00014 Helsinki, Finland.

Ermei Mäkilä (E)

Laboratory of Industrial Physics, Department of Physics and Astronomy, University of Turku, FI-20014 Turku, Finland.

Surachet Imlimthan (S)

Department of Chemistry, Radiochemistry, University of Helsinki, FI-00014 Helsinki, Finland.

Mirkka Sarparanta (M)

Department of Chemistry, Radiochemistry, University of Helsinki, FI-00014 Helsinki, Finland.

Alexandra Correia (A)

Drug Research Program, Division of Pharmaceutical Chemistry and Technology, Faculty of Pharmacy, University of Helsinki, FI-00014 Helsinki, Finland.

Christina Westerveld Haug (C)

Nacamed AS, Askim, Norway.

Jouni Hirvonen (J)

Drug Research Program, Division of Pharmaceutical Chemistry and Technology, Faculty of Pharmacy, University of Helsinki, FI-00014 Helsinki, Finland.

Hélder A Santos (HA)

Drug Research Program, Division of Pharmaceutical Chemistry and Technology, Faculty of Pharmacy, University of Helsinki, FI-00014 Helsinki, Finland; Helsinki Institute of Life Science (HiLIFE), University of Helsinki, FI-00014 Helsinki, Finland. Electronic address: helder.santos@helsinki.fi.

Anu J Airaksinen (AJ)

Department of Chemistry, Radiochemistry, University of Helsinki, FI-00014 Helsinki, Finland. Electronic address: anu.airaksinen@helsinki.fi.

Werner Filtvedt (W)

Nacamed AS, Askim, Norway. Electronic address: werner.filtvedt@dynatec.no.

Jarno Salonen (J)

Laboratory of Industrial Physics, Department of Physics and Astronomy, University of Turku, FI-20014 Turku, Finland. Electronic address: jarno.salonen@utu.fi.

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Classifications MeSH