Direct Imaging of Current-Induced Antiferromagnetic Switching Revealing a Pure Thermomagnetoelastic Switching Mechanism in NiO.

insulating antiferromagnets magnetic domains magnetization switching spin Hall magnetoresistance spintronics

Journal

Nano letters
ISSN: 1530-6992
Titre abrégé: Nano Lett
Pays: United States
ID NLM: 101088070

Informations de publication

Date de publication:
13 Jan 2021
Historique:
pubmed: 12 12 2020
medline: 12 12 2020
entrez: 11 12 2020
Statut: ppublish

Résumé

We unravel the origin of current-induced magnetic switching of insulating antiferromagnet/heavy metal systems. We utilize concurrent transport and magneto-optical measurements to image the switching of antiferromagnetic domains in specially engineered devices of NiO/Pt bilayers. Different electrical pulsing and device geometries reveal different final states of the switching with respect to the current direction. We can explain these through simulations of the temperature-induced strain, and we identify the thermomagnetoelastic switching mechanism combined with thermal excitations as the origin, in which the final state is defined by the strain distributions and heat is required to switch the antiferromagnetic domains. We show that such a potentially very versatile noncontact mechanism can explain the previously reported contradicting observations of the switching final state, which were attributed to spin-orbit torque mechanisms.

Identifiants

pubmed: 33306407
doi: 10.1021/acs.nanolett.0c03367
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

114-119

Auteurs

Hendrik Meer (H)

Institute of Physics, Johannes Gutenberg-University Mainz, 55128 Mainz, Germany.

Felix Schreiber (F)

Institute of Physics, Johannes Gutenberg-University Mainz, 55128 Mainz, Germany.

Christin Schmitt (C)

Institute of Physics, Johannes Gutenberg-University Mainz, 55128 Mainz, Germany.

Rafael Ramos (R)

WPI-Advanced Institute for Materials Research, Tohoku University, Sendai 980-8577, Japan.
Centro de Investigación en Química Biolóxica e Materiais Moleculares (CIQUS), Departamento de Química-Física, Universidade de Santiago de Compostela, Santiago de Compostela 15782, Spain.

Eiji Saitoh (E)

WPI-Advanced Institute for Materials Research, Tohoku University, Sendai 980-8577, Japan.
Institute for Materials Research, Tohoku University, Sendai 980-8577, Japan.
Advanced Science Research Center, Japan Atomic Energy Agency, Tokai 319-1195, Japan.
Center for Spintronics Research Network, Tohoku University, Sendai 980-8577, Japan.
Department of Applied Physics, The University of Tokyo, Tokyo 113-8656, Japan.

Olena Gomonay (O)

Institute of Physics, Johannes Gutenberg-University Mainz, 55128 Mainz, Germany.

Jairo Sinova (J)

Institute of Physics, Johannes Gutenberg-University Mainz, 55128 Mainz, Germany.
Institut of Physics, Academy of Sciences of the Czech Republic, Praha 11720, Czech Republic.
Graduate School of Excellence Materials Science in Mainz, 55128 Mainz, Germany.

Lorenzo Baldrati (L)

Institute of Physics, Johannes Gutenberg-University Mainz, 55128 Mainz, Germany.

Mathias Kläui (M)

Institute of Physics, Johannes Gutenberg-University Mainz, 55128 Mainz, Germany.
Graduate School of Excellence Materials Science in Mainz, 55128 Mainz, Germany.

Classifications MeSH