Electrogravimetry and Structural Properties of Thin Silicon Layers Deposited in Sulfolane and Ionic Liquid Electrolytes.

X-ray photoelectron spectroscopy electrode−electrolyte interface ionic liquids quartz crystal microbalance silicon deposition sulfolane

Journal

ACS applied materials & interfaces
ISSN: 1944-8252
Titre abrégé: ACS Appl Mater Interfaces
Pays: United States
ID NLM: 101504991

Informations de publication

Date de publication:
23 Dec 2020
Historique:
pubmed: 15 12 2020
medline: 15 12 2020
entrez: 14 12 2020
Statut: ppublish

Résumé

Potentiostatic deposition of silicon is performed in sulfolane (SL) and ionic liquid (IL) electrolytes. Electrochemical quartz crystal microbalance with damping monitoring (EQCM-D) is used as main analytical tool for the characterization of the reduction process. The apparent molar mass (

Identifiants

pubmed: 33307677
doi: 10.1021/acsami.0c14694
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

57526-57538

Auteurs

Steffen Link (S)

Electrochemistry and Electroplating Group, Technische Universität Ilmenau, Gustav-Kirchhoff-Straße 6, Ilmenau 98693, Germany.

Anna Dimitrova (A)

Institute of Physics and Institute of Micro- and Nanotechnologies, MacroNano, Technische Universität Ilmenau, Ilmenau 98693, Germany.

Stefan Krischok (S)

Institute of Physics and Institute of Micro- and Nanotechnologies, MacroNano, Technische Universität Ilmenau, Ilmenau 98693, Germany.

Andreas Bund (A)

Electrochemistry and Electroplating Group, Technische Universität Ilmenau, Gustav-Kirchhoff-Straße 6, Ilmenau 98693, Germany.

Svetlozar Ivanov (S)

Electrochemistry and Electroplating Group, Technische Universität Ilmenau, Gustav-Kirchhoff-Straße 6, Ilmenau 98693, Germany.

Classifications MeSH