Ion tracks in silicon formed by much lower energy deposition than the track formation threshold.
Journal
Scientific reports
ISSN: 2045-2322
Titre abrégé: Sci Rep
Pays: England
ID NLM: 101563288
Informations de publication
Date de publication:
08 Jan 2021
08 Jan 2021
Historique:
received:
14
03
2020
accepted:
15
12
2020
entrez:
9
1
2021
pubmed:
10
1
2021
medline:
10
1
2021
Statut:
epublish
Résumé
Damaged regions of cylindrical shapes called ion tracks, typically in nano-meters wide and tens micro-meters long, are formed along the ion trajectories in many insulators, when high energy ions in the electronic stopping regime are injected. In most cases, the ion tracks were assumed as consequences of dense electronic energy deposition from the high energy ions, except some cases where the synergy effect with the nuclear energy deposition plays an important role. In crystalline Si (c-Si), no tracks have been observed with any monomer ions up to GeV. Tracks are formed in c-Si under 40 MeV fullerene (C
Identifiants
pubmed: 33420182
doi: 10.1038/s41598-020-80360-8
pii: 10.1038/s41598-020-80360-8
pmc: PMC7794553
doi:
Types de publication
Journal Article
Langues
eng
Sous-ensembles de citation
IM
Pagination
185Subventions
Organisme : Japan Society for the Promotion of Science
ID : 18K04898
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