Ion tracks in silicon formed by much lower energy deposition than the track formation threshold.


Journal

Scientific reports
ISSN: 2045-2322
Titre abrégé: Sci Rep
Pays: England
ID NLM: 101563288

Informations de publication

Date de publication:
08 Jan 2021
Historique:
received: 14 03 2020
accepted: 15 12 2020
entrez: 9 1 2021
pubmed: 10 1 2021
medline: 10 1 2021
Statut: epublish

Résumé

Damaged regions of cylindrical shapes called ion tracks, typically in nano-meters wide and tens micro-meters long, are formed along the ion trajectories in many insulators, when high energy ions in the electronic stopping regime are injected. In most cases, the ion tracks were assumed as consequences of dense electronic energy deposition from the high energy ions, except some cases where the synergy effect with the nuclear energy deposition plays an important role. In crystalline Si (c-Si), no tracks have been observed with any monomer ions up to GeV. Tracks are formed in c-Si under 40 MeV fullerene (C

Identifiants

pubmed: 33420182
doi: 10.1038/s41598-020-80360-8
pii: 10.1038/s41598-020-80360-8
pmc: PMC7794553
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

185

Subventions

Organisme : Japan Society for the Promotion of Science
ID : 18K04898

Références

Nature. 1958 Aug 9;182(4632):375-7
pubmed: 13577844
Phys Chem Chem Phys. 2015 Sep 21;17(35):22538-42
pubmed: 26267679
J Phys Condens Matter. 2009 Nov 25;21(47):474205
pubmed: 21832484
Sci Rep. 2019 Oct 18;9(1):14980
pubmed: 31628343
Phys Rev B Condens Matter. 1995 Apr 1;51(13):8026-8029
pubmed: 9977411
Sci Rep. 2015 Jan 12;5:7726
pubmed: 25578009

Auteurs

H Amekura (H)

National Institute for Materials Science (NIMS), Tsukuba, Japan. amekura.hiroshi@nims.go.jp.

M Toulemonde (M)

CIMAP, Caen, France.

K Narumi (K)

National Institutes for Quantum and Radiological Science and Technology (QST), Takasaki, Japan.

R Li (R)

National Institute for Materials Science (NIMS), Tsukuba, Japan.
Shandong University, Jinan, China.

A Chiba (A)

National Institutes for Quantum and Radiological Science and Technology (QST), Takasaki, Japan.

Y Hirano (Y)

National Institutes for Quantum and Radiological Science and Technology (QST), Takasaki, Japan.

K Yamada (K)

National Institutes for Quantum and Radiological Science and Technology (QST), Takasaki, Japan.

S Yamamoto (S)

National Institutes for Quantum and Radiological Science and Technology (QST), Takasaki, Japan.

N Ishikawa (N)

Japan Atomic Energy Agency, Tokai, Japan.

N Okubo (N)

Japan Atomic Energy Agency, Tokai, Japan.

Y Saitoh (Y)

National Institutes for Quantum and Radiological Science and Technology (QST), Takasaki, Japan.

Classifications MeSH