Effects of Thermal Annealing on Femtosecond Laser Micromachined Glass Surfaces.

femtosecond laser micromachining fused silica integrated optics roughness analysis thermal annealing

Journal

Micromachines
ISSN: 2072-666X
Titre abrégé: Micromachines (Basel)
Pays: Switzerland
ID NLM: 101640903

Informations de publication

Date de publication:
11 Feb 2021
Historique:
received: 12 12 2020
revised: 02 02 2021
accepted: 07 02 2021
entrez: 6 3 2021
pubmed: 7 3 2021
medline: 7 3 2021
Statut: epublish

Résumé

Femtosecond laser micromachining (FLM) of fused silica allows for the realization of three-dimensional embedded optical elements and microchannels with micrometric feature size. The performances of these components are strongly affected by the machined surface quality and residual roughness. The polishing of 3D buried structures in glass was demonstrated using different thermal annealing processes, but precise control of the residual roughness obtained with this technique is still missing. In this work, we investigate how the FLM irradiation parameters affect surface roughness and we characterize the improvement of surface quality after thermal annealing. As a result, we achieved a strong roughness reduction, from an average value of 49 nm down to 19 nm. As a proof of concept, we studied the imaging performances of embedded mirrors before and after thermal polishing, showing the capacity to preserve a minimum feature size of the reflected image lower than μ5μm. These results allow for us to push forward the capabilities of this enabling fabrication technology, and they can be used as a starting point to improve the performances of more complex optical elements, such as hollow waveguides or micro-lenses.

Identifiants

pubmed: 33670373
pii: mi12020180
doi: 10.3390/mi12020180
pmc: PMC7918068
pii:
doi:

Types de publication

Journal Article

Langues

eng

Subventions

Organisme : H2020 Excellent Science
ID : 801336

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Auteurs

Federico Sala (F)

Department of Physics, Politecnico di Milano, Piazza Leonardo da Vinci 32, 20133 Milano, Italy.
Istituto di Fotonica e Nanotecnologie, CNR, Piazza Leonardo da Vinci 32, 20133 Milano, Italy.

Petra Paié (P)

Istituto di Fotonica e Nanotecnologie, CNR, Piazza Leonardo da Vinci 32, 20133 Milano, Italy.

Rebeca Martínez Vázquez (R)

Istituto di Fotonica e Nanotecnologie, CNR, Piazza Leonardo da Vinci 32, 20133 Milano, Italy.

Roberto Osellame (R)

Department of Physics, Politecnico di Milano, Piazza Leonardo da Vinci 32, 20133 Milano, Italy.
Istituto di Fotonica e Nanotecnologie, CNR, Piazza Leonardo da Vinci 32, 20133 Milano, Italy.

Francesca Bragheri (F)

Istituto di Fotonica e Nanotecnologie, CNR, Piazza Leonardo da Vinci 32, 20133 Milano, Italy.

Classifications MeSH