Correlating Structure and Detection Properties in HgTe Nanocrystal Films.

HgTe electron tomography field-effect transistor gate effect p−n junction tight binding simulation

Journal

Nano letters
ISSN: 1530-6992
Titre abrégé: Nano Lett
Pays: United States
ID NLM: 101088070

Informations de publication

Date de publication:
26 May 2021
Historique:
pubmed: 7 5 2021
medline: 7 5 2021
entrez: 6 5 2021
Statut: ppublish

Résumé

HgTe nanocrystals (NCs) enable broadly tunable infrared absorption, now commonly used to design light sensors. This material tends to grow under multipodic shapes and does not present well-defined size distributions. Such point generates traps and reduces the particle packing, leading to a reduced mobility. It is thus highly desirable to comprehensively explore the effect of the shape on their performance. Here, we show, using a combination of electron tomography and tight binding simulations, that the charge dissociation is strong within HgTe NCs, but poorly shape dependent. Then, we design a dual-gate field-effect-transistor made of tripod HgTe NCs and use it to generate a planar p-n junction, offering more tunability than its vertical geometry counterpart. Interestingly, the performance of the tripods is higher than sphere ones, and this can be correlated with a stronger Te excess in the case of sphere shapes which is responsible for a higher hole trap density.

Identifiants

pubmed: 33956449
doi: 10.1021/acs.nanolett.0c04346
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

4145-4151

Auteurs

Sang-Soo Chee (SS)

CNRS, Institut des NanoSciences de Paris, Sorbonne Université, 4 place Jussieu, 75005 Paris, France.
Nanomaterials and Nanotechnology Center, Korea Institute of Ceramic Engineering and Technology (KICET), 101 Soho-ro, 52851 Jinju-si, Republic of Korea.

Charlie Gréboval (C)

CNRS, Institut des NanoSciences de Paris, Sorbonne Université, 4 place Jussieu, 75005 Paris, France.

Debora Vale Magalhaes (DV)

Electron Microscopy for Materials Science, University of Antwerp, Groenenborgerlaan 171, B-2020 Antwerp, Belgium.
NANOlab Center of Excellence, University of Antwerp, B-2020 Antwerp, Belgium.

Julien Ramade (J)

Electron Microscopy for Materials Science, University of Antwerp, Groenenborgerlaan 171, B-2020 Antwerp, Belgium.
NANOlab Center of Excellence, University of Antwerp, B-2020 Antwerp, Belgium.

Audrey Chu (A)

CNRS, Institut des NanoSciences de Paris, Sorbonne Université, 4 place Jussieu, 75005 Paris, France.

Junling Qu (J)

CNRS, Institut des NanoSciences de Paris, Sorbonne Université, 4 place Jussieu, 75005 Paris, France.

Prachi Rastogi (P)

CNRS, Institut des NanoSciences de Paris, Sorbonne Université, 4 place Jussieu, 75005 Paris, France.

Adrien Khalili (A)

CNRS, Institut des NanoSciences de Paris, Sorbonne Université, 4 place Jussieu, 75005 Paris, France.

Tung Huu Dang (TH)

CNRS, Institut des NanoSciences de Paris, Sorbonne Université, 4 place Jussieu, 75005 Paris, France.
Laboratoire de Physique de l'Ecole normale supérieure, ENS, Université PSL, CNRS, Sorbonne Université, Université Paris-Diderot, Sorbonne Paris Cité, 75005 Paris, France.

Corentin Dabard (C)

CNRS, Institut des NanoSciences de Paris, Sorbonne Université, 4 place Jussieu, 75005 Paris, France.

Yoann Prado (Y)

CNRS, Institut des NanoSciences de Paris, Sorbonne Université, 4 place Jussieu, 75005 Paris, France.

Gilles Patriarche (G)

Centre de Nanosciences et de Nanotechnologies, CNRS, Université Paris-Saclay, C2N, Palaiseau 2110, France.

Julien Chaste (J)

Centre de Nanosciences et de Nanotechnologies, CNRS, Université Paris-Saclay, C2N, Palaiseau 2110, France.

Michael Rosticher (M)

Laboratoire de Physique de l'Ecole normale supérieure, ENS, Université PSL, CNRS, Sorbonne Université, Université Paris-Diderot, Sorbonne Paris Cité, 75005 Paris, France.

Sara Bals (S)

Electron Microscopy for Materials Science, University of Antwerp, Groenenborgerlaan 171, B-2020 Antwerp, Belgium.
NANOlab Center of Excellence, University of Antwerp, B-2020 Antwerp, Belgium.

Christophe Delerue (C)

Université Lille, CNRS, Centrale Lille, Université Polytechnique Hauts-de-France, Junia, UMR 8520 - IEMN F-59000 Lille, France.

Emmanuel Lhuillier (E)

CNRS, Institut des NanoSciences de Paris, Sorbonne Université, 4 place Jussieu, 75005 Paris, France.

Classifications MeSH