Negative-tone molecular glass photoresist for high-resolution electron beam lithography.
electron beam lithography
molecular glass photoresist
negative-tone photoresist
photolithography
photoresist
Journal
Royal Society open science
ISSN: 2054-5703
Titre abrégé: R Soc Open Sci
Pays: England
ID NLM: 101647528
Informations de publication
Date de publication:
03 Mar 2021
03 Mar 2021
Historique:
entrez:
7
5
2021
pubmed:
8
5
2021
medline:
8
5
2021
Statut:
epublish
Résumé
A low molecular weight organic compound containing bis-phenol A backbone (BPA-6OH) is reported as a negative-tone photoresist. This material has a high glass transition temperature and excellent thermal stability. A good contrast, well-resolved line pattern around 73.4 nm and sensitivity of 52 µC cm
Identifiants
pubmed: 33959364
doi: 10.1098/rsos.202132
pii: rsos202132
pmc: PMC8074933
doi:
Banques de données
figshare
['10.6084/m9.figshare.c.5320218']
Types de publication
Journal Article
Langues
eng
Pagination
202132Informations de copyright
© 2021 The Authors.
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