Insights into Microscopic Crystal Growth Dynamics of CH

crystal growth in situ GIWAXS organolead halide perovskite vacuum deposition

Journal

ACS applied materials & interfaces
ISSN: 1944-8252
Titre abrégé: ACS Appl Mater Interfaces
Pays: United States
ID NLM: 101504991

Informations de publication

Date de publication:
19 May 2021
Historique:
pubmed: 8 5 2021
medline: 8 5 2021
entrez: 7 5 2021
Statut: ppublish

Résumé

The process dynamics for the vacuum deposition of methylammonium lead iodide (MAPbI

Identifiants

DOI: 10.1021/acsami.1c04488 PMID: 33961389
pubmed: 33961389
doi: 10.1021/acsami.1c04488
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

22559-22566

Auteurs

Tetsuhiko Miyadera (T)

National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan.
ORCID: 0000-0002-3661-8297

Yuto Auchi (Y)

National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan.
Saitama University, Shimo-Okubo 255, Sakura-ku, Saitama-shi, Saitama 338-8570, Japan.

Kohei Yamamoto (K)

National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan.

Noboru Ohashi (N)

National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan.

Tomoyuki Koganezawa (T)

Japan Synchrotron Radiation Research Institute (JASRI), 1-1-1 Kouto, Sayo-cho, Sayo-gun, Hyogo 679-5198, Japan.

Hiroyuki Yaguchi (H)

Saitama University, Shimo-Okubo 255, Sakura-ku, Saitama-shi, Saitama 338-8570, Japan.

Yuji Yoshida (Y)

National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan.

Masayuki Chikamatsu (M)

National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan.

Classifications MeSH