Towards single-chip radiofrequency signal processing via acoustoelectric electron-phonon interactions.


Journal

Nature communications
ISSN: 2041-1723
Titre abrégé: Nat Commun
Pays: England
ID NLM: 101528555

Informations de publication

Date de publication:
13 May 2021
Historique:
received: 11 09 2020
accepted: 07 04 2021
entrez: 14 5 2021
pubmed: 15 5 2021
medline: 15 5 2021
Statut: epublish

Résumé

The addition of active, nonlinear, and nonreciprocal functionalities to passive piezoelectric acoustic wave technologies could enable all-acoustic and therefore ultra-compact radiofrequency signal processors. Toward this goal, we present a heterogeneously integrated acoustoelectric material platform consisting of a 50 nm indium gallium arsenide epitaxial semiconductor film in direct contact with a 41° YX lithium niobate piezoelectric substrate. We then demonstrate three of the main components of an all-acoustic radiofrequency signal processor: passive delay line filters, amplifiers, and circulators. Heterogeneous integration allows for simultaneous, independent optimization of the piezoelectric-acoustic and electronic properties, leading to the highest performing surface acoustic wave amplifiers ever developed in terms of gain per unit length and DC power dissipation, as well as the first-ever demonstrated acoustoelectric circulator with an isolation of 46 dB with a pulsed DC bias. Finally, we describe how the remaining components of an all-acoustic radiofrequency signal processor are an extension of this work.

Identifiants

pubmed: 33986271
doi: 10.1038/s41467-021-22935-1
pii: 10.1038/s41467-021-22935-1
pmc: PMC8119416
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

2769

Références

IEEE Trans Ultrason Ferroelectr Freq Control. 2001 Nov;48(6):1517-26
pubmed: 11800113
Nature. 2020 Dec;588(7839):599-603
pubmed: 33361793
Nat Commun. 2020 Mar 3;11(1):1166
pubmed: 32127538
IEEE Trans Ultrason Ferroelectr Freq Control. 2018 Nov;65(11):2205-2207
pubmed: 30235124
IEEE Trans Ultrason Ferroelectr Freq Control. 2019 Aug;66(8):1373-1386
pubmed: 31094687

Auteurs

Lisa Hackett (L)

Microsystems Engineering, Science, and Applications, Sandia National Laboratories, Albuquerque, NM, USA.

Michael Miller (M)

Microsystems Engineering, Science, and Applications, Sandia National Laboratories, Albuquerque, NM, USA.

Felicia Brimigion (F)

Microsystems Engineering, Science, and Applications, Sandia National Laboratories, Albuquerque, NM, USA.

Daniel Dominguez (D)

Microsystems Engineering, Science, and Applications, Sandia National Laboratories, Albuquerque, NM, USA.

Greg Peake (G)

Microsystems Engineering, Science, and Applications, Sandia National Laboratories, Albuquerque, NM, USA.

Anna Tauke-Pedretti (A)

Microsystems Engineering, Science, and Applications, Sandia National Laboratories, Albuquerque, NM, USA.

Shawn Arterburn (S)

Microsystems Engineering, Science, and Applications, Sandia National Laboratories, Albuquerque, NM, USA.

Thomas A Friedmann (TA)

Microsystems Engineering, Science, and Applications, Sandia National Laboratories, Albuquerque, NM, USA.

Matt Eichenfield (M)

Microsystems Engineering, Science, and Applications, Sandia National Laboratories, Albuquerque, NM, USA. meichen@sandia.gov.

Classifications MeSH