Electron ptychography achieves atomic-resolution limits set by lattice vibrations.


Journal

Science (New York, N.Y.)
ISSN: 1095-9203
Titre abrégé: Science
Pays: United States
ID NLM: 0404511

Informations de publication

Date de publication:
21 05 2021
Historique:
received: 21 12 2020
accepted: 13 04 2021
entrez: 21 5 2021
pubmed: 22 5 2021
medline: 22 5 2021
Statut: ppublish

Résumé

Transmission electron microscopes use electrons with wavelengths of a few picometers, potentially capable of imaging individual atoms in solids at a resolution ultimately set by the intrinsic size of an atom. However, owing to lens aberrations and multiple scattering of electrons in the sample, the image resolution is reduced by a factor of 3 to 10. By inversely solving the multiple scattering problem and overcoming the electron-probe aberrations using electron ptychography, we demonstrate an instrumental blurring of less than 20 picometers and a linear phase response in thick samples. The measured widths of atomic columns are limited by thermal fluctuations of the atoms. Our method is also capable of locating embedded atomic dopant atoms in all three dimensions with subnanometer precision from only a single projection measurement.

Identifiants

pubmed: 34016774
pii: 372/6544/826
doi: 10.1126/science.abg2533
doi:

Types de publication

Journal Article Research Support, U.S. Gov't, Non-P.H.S.

Langues

eng

Sous-ensembles de citation

IM

Pagination

826-831

Informations de copyright

Copyright © 2021 The Authors, some rights reserved; exclusive licensee American Association for the Advancement of Science. No claim to original U.S. Government Works.

Auteurs

Zhen Chen (Z)

School of Applied and Engineering Physics, Cornell University, Ithaca, NY 14853, USA. zhen.chen@cornell.edu david.a.muller@cornell.edu.

Yi Jiang (Y)

Advanced Photon Source, Argonne National Laboratory, Lemont, IL 60439, USA.

Yu-Tsun Shao (YT)

School of Applied and Engineering Physics, Cornell University, Ithaca, NY 14853, USA.

Megan E Holtz (ME)

Department of Materials Science and Engineering, Cornell University, Ithaca, NY, USA.

Michal Odstrčil (M)

Paul Scherrer Institut, 5232 Villigen PSI, Switzerland.

Manuel Guizar-Sicairos (M)

Paul Scherrer Institut, 5232 Villigen PSI, Switzerland.

Isabelle Hanke (I)

Leibniz-Institut für Kristallzüchtung, Max-Born-Str. 2, 12489 Berlin, Germany.

Steffen Ganschow (S)

Leibniz-Institut für Kristallzüchtung, Max-Born-Str. 2, 12489 Berlin, Germany.

Darrell G Schlom (DG)

Department of Materials Science and Engineering, Cornell University, Ithaca, NY, USA.
Leibniz-Institut für Kristallzüchtung, Max-Born-Str. 2, 12489 Berlin, Germany.
Kavli Institute at Cornell for Nanoscale Science, Ithaca, NY, USA.

David A Muller (DA)

School of Applied and Engineering Physics, Cornell University, Ithaca, NY 14853, USA. zhen.chen@cornell.edu david.a.muller@cornell.edu.
Kavli Institute at Cornell for Nanoscale Science, Ithaca, NY, USA.

Classifications MeSH