Multicomponent Covalent Chemical Patterning of Graphene.

Raman spectroscopy chemical patterning covalent patterning graphene multifunctional surfaces

Journal

ACS nano
ISSN: 1936-086X
Titre abrégé: ACS Nano
Pays: United States
ID NLM: 101313589

Informations de publication

Date de publication:
22 Jun 2021
Historique:
pubmed: 29 5 2021
medline: 29 5 2021
entrez: 28 5 2021
Statut: ppublish

Résumé

The chemical patterning of graphene is being pursued tenaciously due to exciting possibilities in electronics, catalysis, sensing, and photonics. Despite the intense efforts, spatially controlled, multifunctional covalent patterning of graphene has not been achieved. The lack of control originates from the inherently poor reactivity of the basal plane of graphene, which necessitates the use of harsh chemistries. Here, we demonstrate spatially resolved multicomponent covalent chemical patterning of single layer graphene using a facile and efficient method. Three different functional groups could be covalently attached to the basal plane in dense, well-defined patterns using a combination of lithography and a self-limiting variant of diazonium chemistry requiring no need for graphene activation. The layer thickness of the covalent films could be controlled down to 1 nm. This work provides a solid foundation for the fabrication of chemically patterned multifunctional graphene interfaces for device applications.

Identifiants

pubmed: 34047547
doi: 10.1021/acsnano.1c03373
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

10618-10627

Auteurs

Miriam C Rodríguez González (MC)

Department of Chemistry, Division of Molecular Imaging and Photonics, KU Leuven, Celestijnenlaan 200F, B-3001 Leuven, Belgium.

Alessandra Leonhardt (A)

Interuniversitair Micro-Electronica Centrum (imec) vzw, Kapeldreef 75, B-3001 Leuven, Belgium.

Hartmut Stadler (H)

Bruker Nanoscience Division, Östliche Rheinbrückenstr. 49, 76187 Karlsruhe, Germany.

Samuel Eyley (S)

Department of Chemical Engineering, Sustainable Materials Lab, KU Leuven Campus Kulak Kortrijk, Etienne Sabbelaan 53, 8500 Kortrijk, Belgium.

Wim Thielemans (W)

Department of Chemical Engineering, Sustainable Materials Lab, KU Leuven Campus Kulak Kortrijk, Etienne Sabbelaan 53, 8500 Kortrijk, Belgium.

Stefan De Gendt (S)

Interuniversitair Micro-Electronica Centrum (imec) vzw, Kapeldreef 75, B-3001 Leuven, Belgium.

Kunal S Mali (KS)

Department of Chemistry, Division of Molecular Imaging and Photonics, KU Leuven, Celestijnenlaan 200F, B-3001 Leuven, Belgium.

Steven De Feyter (S)

Department of Chemistry, Division of Molecular Imaging and Photonics, KU Leuven, Celestijnenlaan 200F, B-3001 Leuven, Belgium.

Classifications MeSH