Integrating Sphere Fourier Microscopy of Highly Directional Emission.


Journal

ACS photonics
ISSN: 2330-4022
Titre abrégé: ACS Photonics
Pays: United States
ID NLM: 101634366

Informations de publication

Date de publication:
21 Apr 2021
Historique:
received: 04 01 2021
entrez: 31 5 2021
pubmed: 1 6 2021
medline: 1 6 2021
Statut: ppublish

Résumé

Accurately controlling light emission using nano- and microstructured lenses and antennas is an active field of research. Dielectrics are especially attractive lens materials due to their low optical losses over a broad bandwidth. In this work we measure highly directional light emission from patterned quantum dots (QDs) aligned underneath all-dielectric nanostructured microlenses. The lenses are designed with an evolutionary algorithm and have a theoretical directivity of 160. The fabricated structures demonstrate an experimental full directivity of 61 ± 3, three times higher than what has been estimated before, with a beaming half-angle of 2.6°. This high value compared to previous works is achieved via three mechanisms. First, direct electron beam patterning of QD emitters and alignment markers allowed for more localized emission and better emitter-lens alignment. Second, the lens fabrication was refined to minimize distortions between the designed shape and the final structure. Finally, a new measurement technique was developed that combines integrating sphere microscopy with Fourier microscopy. This enables complete directivity measurements, contrary to other reported values, which are typically only partial directivities or estimates of the full directivity that rely partly on simulations. The experimentally measured values of the complete directivity were higher than predicted by combining simulations with partial directivity measurements. High directivity was obtained from three different materials (cadmium-selenide-based QDs and two lead halide perovskite materials), emitting at 520, 620, and 700 nm, by scaling the lens size according to the emission wavelength.

Identifiants

pubmed: 34056035
doi: 10.1021/acsphotonics.1c00010
pmc: PMC8155557
doi:

Types de publication

Journal Article

Langues

eng

Pagination

1143-1151

Informations de copyright

© 2021 The Authors. Published by American Chemical Society.

Déclaration de conflit d'intérêts

The authors declare no competing financial interest.

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Auteurs

Julia S van der Burgt (JS)

AMOLF Institute, 1098XG, Amsterdam, The Netherlands.

Christian D Dieleman (CD)

AMOLF Institute, 1098XG, Amsterdam, The Netherlands.
Advanced Reseach Center for Nanolithography, 1098XG, Amsterdam, The Netherlands.

Eric Johlin (E)

Nanophotonic Energy Materials, Western Engineering, Western University, SEB 3094, London, Canada.

Jaco J Geuchies (JJ)

Optoelectronic Materials, Faculty of Applied Sciences, Delft University of Technology, 2629HZ, Delft, The Netherlands.

Arjan J Houtepen (AJ)

Optoelectronic Materials, Faculty of Applied Sciences, Delft University of Technology, 2629HZ, Delft, The Netherlands.

Bruno Ehrler (B)

AMOLF Institute, 1098XG, Amsterdam, The Netherlands.

Erik C Garnett (EC)

AMOLF Institute, 1098XG, Amsterdam, The Netherlands.

Classifications MeSH