Large intrinsic anomalous Hall effect in SrIrO


Journal

Nature communications
ISSN: 2041-1723
Titre abrégé: Nat Commun
Pays: England
ID NLM: 101528555

Informations de publication

Date de publication:
02 Jun 2021
Historique:
received: 17 06 2020
accepted: 25 04 2021
entrez: 3 6 2021
pubmed: 4 6 2021
medline: 4 6 2021
Statut: epublish

Résumé

The anomalous Hall effect (AHE) is an intriguing transport phenomenon occurring typically in ferromagnets as a consequence of broken time reversal symmetry and spin-orbit interaction. It can be caused by two microscopically distinct mechanisms, namely, by skew or side-jump scattering due to chiral features of the disorder scattering, or by an intrinsic contribution directly linked to the topological properties of the Bloch states. Here we show that the AHE can be artificially engineered in materials in which it is originally absent by combining the effects of symmetry breaking, spin orbit interaction and proximity-induced magnetism. In particular, we find a strikingly large AHE that emerges at the interface between a ferromagnetic manganite (La

Identifiants

pubmed: 34078889
doi: 10.1038/s41467-021-23489-y
pii: 10.1038/s41467-021-23489-y
pmc: PMC8172877
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

3283

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Auteurs

Myoung-Woo Yoo (MW)

Unité Mixte de Physique, CNRS, Thales, Université Paris-Saclay, Palaiseau, France.

J Tornos (J)

GFMC, Dept. Fisica de Materiales, Facultad de Fisica, Universidad Complutense, Madrid, Spain.

A Sander (A)

Unité Mixte de Physique, CNRS, Thales, Université Paris-Saclay, Palaiseau, France.

Ling-Fang Lin (LF)

Department of Physics and Astronomy, University of Tennessee, Knoxville, TN, USA.
School of Physics, Southeast University, Nanjing, China.

Narayan Mohanta (N)

Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN, USA.

A Peralta (A)

GFMC, Dept. Fisica de Materiales, Facultad de Fisica, Universidad Complutense, Madrid, Spain.

D Sanchez-Manzano (D)

GFMC, Dept. Fisica de Materiales, Facultad de Fisica, Universidad Complutense, Madrid, Spain.

F Gallego (F)

GFMC, Dept. Fisica de Materiales, Facultad de Fisica, Universidad Complutense, Madrid, Spain.

D Haskel (D)

Advanced Photon Source Argonne National Laboratory, Lemont, IL, USA.

J W Freeland (JW)

Advanced Photon Source Argonne National Laboratory, Lemont, IL, USA.

D J Keavney (DJ)

Advanced Photon Source Argonne National Laboratory, Lemont, IL, USA.

Y Choi (Y)

Advanced Photon Source Argonne National Laboratory, Lemont, IL, USA.

J Strempfer (J)

Advanced Photon Source Argonne National Laboratory, Lemont, IL, USA.

X Wang (X)

Department of Physics, Bryn Mawr College, Bryn Mawr, PA, USA.

M Cabero (M)

IMDEA Nanoscience Campus Universidad Autonoma, Cantoblanco, Spain.
Centro Nacional de Microscopia Electronica, Universidad Complutense, Madrid, Spain.

Hari Babu Vasili (HB)

CELLS-ALBA Synchrotron Radiation Facility, Cerdanyola del Valles, Spain.

Manuel Valvidares (M)

CELLS-ALBA Synchrotron Radiation Facility, Cerdanyola del Valles, Spain.

G Sanchez-Santolino (G)

GFMC, Dept. Fisica de Materiales, Facultad de Fisica, Universidad Complutense, Madrid, Spain.

J M Gonzalez-Calbet (JM)

Centro Nacional de Microscopia Electronica, Universidad Complutense, Madrid, Spain.
Department Quimica Inorganica, Facultad de Quimica, Universidad Complutense, Madrid, Spain.

A Rivera (A)

GFMC, Dept. Fisica de Materiales, Facultad de Fisica, Universidad Complutense, Madrid, Spain.

C Leon (C)

GFMC, Dept. Fisica de Materiales, Facultad de Fisica, Universidad Complutense, Madrid, Spain.

S Rosenkranz (S)

Materials Science Division, Argonne National Laboratory, Lemont, IL, USA.

M Bibes (M)

Unité Mixte de Physique, CNRS, Thales, Université Paris-Saclay, Palaiseau, France.

A Barthelemy (A)

Unité Mixte de Physique, CNRS, Thales, Université Paris-Saclay, Palaiseau, France.

A Anane (A)

Unité Mixte de Physique, CNRS, Thales, Université Paris-Saclay, Palaiseau, France.

Elbio Dagotto (E)

Department of Physics and Astronomy, University of Tennessee, Knoxville, TN, USA.
Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN, USA.

S Okamoto (S)

Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN, USA.

S G E Te Velthuis (SGE)

Materials Science Division, Argonne National Laboratory, Lemont, IL, USA.

J Santamaria (J)

GFMC, Dept. Fisica de Materiales, Facultad de Fisica, Universidad Complutense, Madrid, Spain. jacsan@ucm.es.

Javier E Villegas (JE)

Unité Mixte de Physique, CNRS, Thales, Université Paris-Saclay, Palaiseau, France.

Classifications MeSH