Table-top extreme ultraviolet second harmonic generation.


Journal

Science advances
ISSN: 2375-2548
Titre abrégé: Sci Adv
Pays: United States
ID NLM: 101653440

Informations de publication

Date de publication:
May 2021
Historique:
received: 02 09 2020
accepted: 30 03 2021
entrez: 17 6 2021
pubmed: 18 6 2021
medline: 18 6 2021
Statut: epublish

Résumé

The lack of available table-top extreme ultraviolet (XUV) sources with high enough fluxes and coherence properties has limited the availability of nonlinear XUV and x-ray spectroscopies to free-electron lasers (FELs). Here, we demonstrate second harmonic generation (SHG) on a table-top XUV source by observing SHG near the Ti M

Identifiants

pubmed: 34138744
pii: 7/21/eabe2265
doi: 10.1126/sciadv.abe2265
pmc: PMC8133706
pii:
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Informations de copyright

Copyright © 2021 The Authors, some rights reserved; exclusive licensee American Association for the Advancement of Science. No claim to original U.S. Government Works. Distributed under a Creative Commons Attribution NonCommercial License 4.0 (CC BY-NC).

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Auteurs

Tobias Helk (T)

Institute of Optics and Quantum Electronics, Abbe Center of Photonics, Friedrich-Schiller University, 07743 Jena, Germany. tobias.helk@uni-jena.de christian.spielmann@uni-jena.de mwz@berkeley.edu.
Helmholtz Institute Jena, 07743 Jena, Germany.

Emma Berger (E)

Department of Chemistry, University of California, Berkeley, Berkeley, CA 94720, USA.
Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA.

Sasawat Jamnuch (S)

ATLAS Materials Physics Laboratory, Department of NanoEngineering and Chemical Engineering, University of California, San Diego, La Jolla, CA 92023, USA.

Lars Hoffmann (L)

Fritz Haber Institute of the Max Planck Society, 14195 Berlin, Germany.

Adeline Kabacinski (A)

Laboratoire d'Optique Appliquée, ENSTA Paris, Ecole Polytechnique, CNRS, Institut Polytechnique de Paris, Palaiseau, France.

Julien Gautier (J)

Laboratoire d'Optique Appliquée, ENSTA Paris, Ecole Polytechnique, CNRS, Institut Polytechnique de Paris, Palaiseau, France.

Fabien Tissandier (F)

Laboratoire d'Optique Appliquée, ENSTA Paris, Ecole Polytechnique, CNRS, Institut Polytechnique de Paris, Palaiseau, France.

Jean-Philipe Goddet (JP)

Laboratoire d'Optique Appliquée, ENSTA Paris, Ecole Polytechnique, CNRS, Institut Polytechnique de Paris, Palaiseau, France.

Hung-Tzu Chang (HT)

Department of Chemistry, University of California, Berkeley, Berkeley, CA 94720, USA.

Juwon Oh (J)

Department of Chemistry, University of California, Berkeley, Berkeley, CA 94720, USA.

C Das Pemmaraju (CD)

Stanford Institute for Materials and Energy Sciences, SLAC National Accelerator Laboratory, Stanford, CA 94025, USA.

Tod A Pascal (TA)

ATLAS Materials Physics Laboratory, Department of NanoEngineering and Chemical Engineering, University of California, San Diego, La Jolla, CA 92023, USA.
Materials Science and Engineering, University of California, San Diego, La Jolla, CA 92023, USA.
Sustainable Power and Energy Center, University of California, San Diego, La Jolla, CA 92023, USA.

Stephane Sebban (S)

Laboratoire d'Optique Appliquée, ENSTA Paris, Ecole Polytechnique, CNRS, Institut Polytechnique de Paris, Palaiseau, France.

Christian Spielmann (C)

Institute of Optics and Quantum Electronics, Abbe Center of Photonics, Friedrich-Schiller University, 07743 Jena, Germany. tobias.helk@uni-jena.de christian.spielmann@uni-jena.de mwz@berkeley.edu.
Helmholtz Institute Jena, 07743 Jena, Germany.

Michael Zuerch (M)

Institute of Optics and Quantum Electronics, Abbe Center of Photonics, Friedrich-Schiller University, 07743 Jena, Germany. tobias.helk@uni-jena.de christian.spielmann@uni-jena.de mwz@berkeley.edu.
Department of Chemistry, University of California, Berkeley, Berkeley, CA 94720, USA.
Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA.
Fritz Haber Institute of the Max Planck Society, 14195 Berlin, Germany.

Classifications MeSH