Mesoscale Confinement Effects and Emergent Quantum Interference in Titania Antidot Thin Films.

electron microscopy electron transport emergent properties nanostructures quantum con_nement titania

Journal

ACS nano
ISSN: 1936-086X
Titre abrégé: ACS Nano
Pays: United States
ID NLM: 101313589

Informations de publication

Date de publication:
24 Aug 2021
Historique:
pubmed: 20 7 2021
medline: 20 7 2021
entrez: 19 7 2021
Statut: ppublish

Résumé

The effect of confinement on electron and ion transport in oxide films is of interest both fundamentally and technologically for the design of next-generation electronic devices. In metal oxides with mobile ions and vacancies, it is the interplay of the different modes of charge transport and the corresponding current-voltage signatures that is of interest. We developed a patterned structure in titania films, with feature sizes of 11-20 nm, that allow us to explore confined transport. We describe how confinement changes the competing charge transport mechanisms, the patterned antidot array leads to displacement fields and confines the charge density that results in modified and emergent electron transport with an increase in conductivity. This emergent behavior can be described by considering electron interference effects. Characterization of the charge transport with electron holography and impedance spectroscopy, and through comparison with modeling, show that nanoscale confinement is a way to control quantum interference.

Identifiants

pubmed: 34279916
doi: 10.1021/acsnano.1c01340
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

12935-12944

Auteurs

Frank Barrows (F)

Materials Science Division, Argonne National Laboratory, Argonne, Illinois 60439, United States.
Program of Applied Physics, Northwestern University, Evanston, Illinois 60208, United States.

Hanu Arava (H)

Materials Science Division, Argonne National Laboratory, Argonne, Illinois 60439, United States.
Northwestern-Argonne Institute for Science and Engineering (NAISE), Northwestern University, Evanston, Illinois 60208, United States.

Chun Zhou (C)

Pritzker School of Molecular Engineering, University of Chicago, Chicago, Illinois 60637, United States.

Paul Nealey (P)

Materials Science Division, Argonne National Laboratory, Argonne, Illinois 60439, United States.
Pritzker School of Molecular Engineering, University of Chicago, Chicago, Illinois 60637, United States.

Tamar Segal-Peretz (T)

The Wolfson Department of Chemical Engineering, Technion - Israel Institute of Technology, Haifa 3200003, Israel.

Yuzi Liu (Y)

Center for Nanoscale Materials, Argonne National Laboratory, Argonne, Illinois 60439, United States.

Saidur Bakaul (S)

Materials Science Division, Argonne National Laboratory, Argonne, Illinois 60439, United States.

Charudatta Phatak (C)

Materials Science Division, Argonne National Laboratory, Argonne, Illinois 60439, United States.
Northwestern-Argonne Institute for Science and Engineering (NAISE), Northwestern University, Evanston, Illinois 60208, United States.

Amanda Petford-Long (A)

Materials Science Division, Argonne National Laboratory, Argonne, Illinois 60439, United States.
Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, United States.

Classifications MeSH