Multipulsed Millisecond Ozone Gasification for Predictable Tuning of Nucleation and Nucleation-Decoupled Nanopore Expansion in Graphene for Carbon Capture.

carbon capture membrane nanopore pore expansion pore nucleation single-layer graphene

Journal

ACS nano
ISSN: 1936-086X
Titre abrégé: ACS Nano
Pays: United States
ID NLM: 101313589

Informations de publication

Date de publication:
24 Aug 2021
Historique:
pubmed: 29 7 2021
medline: 29 7 2021
entrez: 28 7 2021
Statut: ppublish

Résumé

Predictable and tunable etching of angstrom-scale nanopores in single-layer graphene (SLG) can allow one to realize high-performance gas separation even from similar-sized molecules. We advance toward this goal by developing two etching regimes for SLG where the incorporation of angstrom-scale vacancy defects can be controlled. We screen several exposure profiles for the etchant, controlled by a multipulse millisecond treatment, using a mathematical model predicting the nucleation and pore expansion rates. The screened profiles yield a narrow pore-size-distribution (PSD) with a majority of defects smaller than missing 16 carbon atoms, suitable for CO

Identifiants

pubmed: 34319081
doi: 10.1021/acsnano.1c02927
pmc: PMC8388115
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

13230-13239

Auteurs

Kuang-Jung Hsu (KJ)

Laboratory of Advanced Separations (LAS), École Polytechnique Fédérale de Lausanne (EPFL), Rue de l'Industrie 17, CH-1951 Sion, Switzerland.

Luis Francisco Villalobos (LF)

Laboratory of Advanced Separations (LAS), École Polytechnique Fédérale de Lausanne (EPFL), Rue de l'Industrie 17, CH-1951 Sion, Switzerland.

Shiqi Huang (S)

Laboratory of Advanced Separations (LAS), École Polytechnique Fédérale de Lausanne (EPFL), Rue de l'Industrie 17, CH-1951 Sion, Switzerland.

Heng-Yu Chi (HY)

Laboratory of Advanced Separations (LAS), École Polytechnique Fédérale de Lausanne (EPFL), Rue de l'Industrie 17, CH-1951 Sion, Switzerland.

Mostapha Dakhchoune (M)

Laboratory of Advanced Separations (LAS), École Polytechnique Fédérale de Lausanne (EPFL), Rue de l'Industrie 17, CH-1951 Sion, Switzerland.

Wan-Chi Lee (WC)

Laboratory of Advanced Separations (LAS), École Polytechnique Fédérale de Lausanne (EPFL), Rue de l'Industrie 17, CH-1951 Sion, Switzerland.

Guangwei He (G)

Laboratory of Advanced Separations (LAS), École Polytechnique Fédérale de Lausanne (EPFL), Rue de l'Industrie 17, CH-1951 Sion, Switzerland.

Mounir Mensi (M)

Institut des Sciences et Ingénierie Chimiques, École Polytechnique Fédérale de Lausanne, Rue de l'Industrie 17, CH-1951 Sion, Switzerland.

Kumar Varoon Agrawal (KV)

Laboratory of Advanced Separations (LAS), École Polytechnique Fédérale de Lausanne (EPFL), Rue de l'Industrie 17, CH-1951 Sion, Switzerland.

Classifications MeSH