Size-Selective Sub-micrometer-Particle Confinement Utilizing Ionic Entropy-Directed Trapping in Inscribed Nanovoid Patterns.

continuous nanoinscribing electrical double layer electrostatic interaction ionic entropy nanovoid size-selective particle confinement

Journal

ACS nano
ISSN: 1936-086X
Titre abrégé: ACS Nano
Pays: United States
ID NLM: 101313589

Informations de publication

Date de publication:
28 Sep 2021
Historique:
pubmed: 17 8 2021
medline: 17 8 2021
entrez: 16 8 2021
Statut: ppublish

Résumé

We have developed a single-step, high-throughput methodology to selectively confine sub-micrometer particles of a specific size into sequentially inscribed nanovoid patterns by utilizing electrostatic and entropic particle-void interactions in an ionic solution. The nanovoid patterns can be rendered positively charged by coating with an aluminum oxide layer, which can then localize negatively charged particles of a specific size into ordered arrays defined by the nanovoid topography. On the basis of the Poisson-Boltzmann model, the size-selective localization of particles in the voids is directed by the interplay between particle-nanovoid geometry, electrostatic interactions, and ionic entropy change induced by charge regulation in the electrical double layer overlapping region. The underlying principle and developed method could potentially be extended to size-selective trapping, separation, and patterning of many other objects including biological structures.

Identifiants

pubmed: 34398602
doi: 10.1021/acsnano.1c00014
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

14185-14192

Auteurs

Long Chen (L)

Applied Physics, University of Michigan, 450 Church Street, Ann Arbor, Michigan 48109, United States.
Department of Electrical Engineering and Computer Science, University of Michigan, 1301 Beal Avenue, Ann Arbor, Michigan 48109, United States.

Ashwin Panday (A)

Macromolecular Science and Engineering, University of Michigan, 1221 Beal Avenue, Ann Arbor, Michigan 48109, United States.

Jonggab Park (J)

Department of Mechanical and Automotive Engineering, Seoul National University of Science and Technology, 232 Gongneung-ro, Nowon-gu, Seoul 01811, Republic of Korea.

Mingyu Kim (M)

Department of Mechanical and Automotive Engineering, Seoul National University of Science and Technology, 232 Gongneung-ro, Nowon-gu, Seoul 01811, Republic of Korea.

Dong Kyo Oh (DK)

Department of Mechanical and Automotive Engineering, Seoul National University of Science and Technology, 232 Gongneung-ro, Nowon-gu, Seoul 01811, Republic of Korea.
Department of Mechanical Engineering, Pohang University of Science and Technology (POSTECH), 77 Cheongam-ro, Nam-gu, Pohang 37673, Republic of Korea.

Jong G Ok (JG)

Department of Mechanical and Automotive Engineering, Seoul National University of Science and Technology, 232 Gongneung-ro, Nowon-gu, Seoul 01811, Republic of Korea.

L Jay Guo (LJ)

Applied Physics, University of Michigan, 450 Church Street, Ann Arbor, Michigan 48109, United States.
Department of Electrical Engineering and Computer Science, University of Michigan, 1301 Beal Avenue, Ann Arbor, Michigan 48109, United States.
Macromolecular Science and Engineering, University of Michigan, 1221 Beal Avenue, Ann Arbor, Michigan 48109, United States.

Classifications MeSH