Further Increasing the Accuracy of Characterization of a Thin Dielectric or Semiconductor Film on a Substrate from Its Interference Transmittance Spectrum.

dielectric film envelope method increased characterization accuracy semiconductor film thin film transmittance spectrum

Journal

Materials (Basel, Switzerland)
ISSN: 1996-1944
Titre abrégé: Materials (Basel)
Pays: Switzerland
ID NLM: 101555929

Informations de publication

Date de publication:
19 Aug 2021
Historique:
received: 29 06 2021
revised: 12 08 2021
accepted: 17 08 2021
entrez: 27 8 2021
pubmed: 28 8 2021
medline: 28 8 2021
Statut: epublish

Résumé

Three means are investigated for further increasing the accuracy of the characterization of a thin film on a substrate, from the transmittance spectrum

Identifiants

pubmed: 34443203
pii: ma14164681
doi: 10.3390/ma14164681
pmc: PMC8399147
pii:
doi:

Types de publication

Journal Article

Langues

eng

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Auteurs

Dorian Minkov (D)

College of Energy and Electronics, Technical University of Sofia, 2140 Botevgrad, Bulgaria.

Emilio Marquez (E)

Department of Condensed-Matter Physics, Faculty of Science, University of Cadiz, 11510 Puerto Real, Spain.

George Angelov (G)

Department of Microelectronics, Technical University of Sofia, 1000 Sofia, Bulgaria.

Gavril Gavrilov (G)

College of Energy and Electronics, Technical University of Sofia, 2140 Botevgrad, Bulgaria.

Susana Ruano (S)

Photovoltaic Solar Energy Unit, Energy Department, CIEMAT, Avenida Complutense 40, 28040 Madrid, Spain.

Elias Saugar (E)

Photovoltaic Solar Energy Unit, Energy Department, CIEMAT, Avenida Complutense 40, 28040 Madrid, Spain.

Classifications MeSH