Smart-cut-like laser slicing of GaN substrate using its own nitrogen.


Journal

Scientific reports
ISSN: 2045-2322
Titre abrégé: Sci Rep
Pays: England
ID NLM: 101563288

Informations de publication

Date de publication:
09 Sep 2021
Historique:
received: 08 06 2021
accepted: 18 08 2021
entrez: 10 9 2021
pubmed: 11 9 2021
medline: 11 9 2021
Statut: epublish

Résumé

We have investigated the possibility of applying lasers to slice GaN substrates. Using a sub-nanosecond laser with a wavelength of 532 nm, we succeeded in slicing GaN substrates. In the laser slicing method used in this study, there was almost no kerf loss, and the thickness of the layer damaged by laser slicing was about 40 µm. We demonstrated that a standard high quality homoepitaxial layer can be grown on the sliced surface after removing the damaged layer by polishing.

Identifiants

pubmed: 34504143
doi: 10.1038/s41598-021-97159-w
pii: 10.1038/s41598-021-97159-w
pmc: PMC8429715
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

17949

Informations de copyright

© 2021. The Author(s).

Références

Materials (Basel). 2019 Feb 26;12(5):
pubmed: 30813566

Auteurs

Atsushi Tanaka (A)

Center for Integrated Research of Future Electronics (CIRFE), Institute of Materials and Systems for Sustainability (IMaSS), Nagoya University, Aichi, 464-8601, Japan. a_tanaka@nuee.nagoya-u.ac.jp.
National Institute for Materials Science, Tsukuba, 987-6543, Japan. a_tanaka@nuee.nagoya-u.ac.jp.

Ryuji Sugiura (R)

Electron Tube Division, Research & Development Department, Hamamatsu Photonics K. K., Shizuoka, 438-0193, Japan.

Daisuke Kawaguchi (D)

Electron Tube Division, Research & Development Department, Hamamatsu Photonics K. K., Shizuoka, 438-0193, Japan.

Toshiki Yui (T)

Electron Tube Division, Research & Development Department, Hamamatsu Photonics K. K., Shizuoka, 438-0193, Japan.

Yotaro Wani (Y)

Electron Tube Division, Research & Development Department, Hamamatsu Photonics K. K., Shizuoka, 438-0193, Japan.

Tomomi Aratani (T)

Electron Tube Division, Research & Development Department, Hamamatsu Photonics K. K., Shizuoka, 438-0193, Japan.

Hirotaka Watanabe (H)

Center for Integrated Research of Future Electronics (CIRFE), Institute of Materials and Systems for Sustainability (IMaSS), Nagoya University, Aichi, 464-8601, Japan.

Hadi Sena (H)

Center for Integrated Research of Future Electronics (CIRFE), Institute of Materials and Systems for Sustainability (IMaSS), Nagoya University, Aichi, 464-8601, Japan.

Yoshio Honda (Y)

Center for Integrated Research of Future Electronics (CIRFE), Institute of Materials and Systems for Sustainability (IMaSS), Nagoya University, Aichi, 464-8601, Japan.

Yasunori Igasaki (Y)

Electron Tube Division, Research & Development Department, Hamamatsu Photonics K. K., Shizuoka, 438-0193, Japan.

Hiroshi Amano (H)

Center for Integrated Research of Future Electronics (CIRFE), Institute of Materials and Systems for Sustainability (IMaSS), Nagoya University, Aichi, 464-8601, Japan.
National Institute for Materials Science, Tsukuba, 987-6543, Japan.

Classifications MeSH