Sublimation-doping with super bases for high-performance solution-processed heterojunction oxide thin film transistors.

Journal

Materials horizons
ISSN: 2051-6355
Titre abrégé: Mater Horiz
Pays: England
ID NLM: 101623537

Informations de publication

Date de publication:
01 Nov 2021
Historique:
pubmed: 14 9 2021
medline: 14 9 2021
entrez: 13 9 2021
Statut: epublish

Résumé

We elucidate how non-destructive sublimation-doping of In

Identifiants

DOI: 10.1039/d1mh00929j PMID: 34515283
pubmed: 34515283
doi: 10.1039/d1mh00929j
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

3105-3112

Auteurs

Juhyeok Lee (J)

Department of Chemical Engineering, Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of Korea. dchung@postech.ac.kr.

Mingyu Jae (M)

Department of Chemical Engineering, Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of Korea. dchung@postech.ac.kr.

Syed Zahid Hassan (SZ)

Department of Chemical Engineering, Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of Korea. dchung@postech.ac.kr.

Dae Sung Chung (DS)

Department of Chemical Engineering, Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of Korea. dchung@postech.ac.kr.
ORCID: 0000-0003-1313-8298

Classifications MeSH