Radial spatiotemporal evolution of rf magnetic field and plasma current in a very-high-frequency plasma source over a wide range of plasma density and pressure.


Journal

Physical review. E
ISSN: 2470-0053
Titre abrégé: Phys Rev E
Pays: United States
ID NLM: 101676019

Informations de publication

Date de publication:
Aug 2021
Historique:
received: 14 01 2020
accepted: 22 07 2021
entrez: 16 9 2021
pubmed: 17 9 2021
medline: 17 9 2021
Statut: ppublish

Résumé

We present detailed spatiotemporal measurements of rf magnetic fields and plasma conduction current as well as the corresponding plasma density profiles when very-high-frequency 100-MHz waves are introduced to a parallel plate plasma. The magnetic probe, optical emission, and plasma absorption probe measurements support a model in which the interaction of high-frequency waves with the moving plasma sheath at specific phases of the very high frequencies (VHF) period leads to local reversals in the vertical rf electric field which can lead to conduction current reversals and circulations. The presence of current reversals and circulation correlate with measured plasma uniformity. In particular, measured electric field and current reversals coincide with the strongly center-peaked plasma density profiles frequently observed in VHF plasma. The magnitude of the center peak increases with the number and magnitude of the current reversal cells. The scale length of the current reversal cells is on the order of what is expected for plasma surface waves. Measurements indicate that plasma conductivity is the common scaling factor for both plasma uniformity and the circulation. The propagation of high-frequency waves and the generation of rf current reversal in one phase of the rf cycle rather than another results in the appearance of harmonics in Fourier decomposed magnetic probe wave forms. These harmonics turn out not to be actual waves or evidence of standing waves at these frequencies but rather consequences of packets of wave propagation that occur periodically.

Identifiants

pubmed: 34525658
doi: 10.1103/PhysRevE.104.025207
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

025207

Auteurs

Jianping Zhao (J)

Concept and Feasibility Laboratory, Tokyo Electron America, Inc., Austin, Texas 78741, USA.

Peter L G Ventzek (PLG)

Concept and Feasibility Laboratory, Tokyo Electron America, Inc., Austin, Texas 78741, USA.

Barton Lane (B)

Concept and Feasibility Laboratory, Tokyo Electron America, Inc., Austin, Texas 78741, USA.

Toshihiko Iwao (T)

Tokyo Electron Technology Solutions Limited, 2381-1 Kitagejo, Fujii-cho, Nirasaki City, Yamanashi 407-8511, Japan.

Kiyotaka Ishibashi (K)

Tokyo Electron Technology Solutions Limited, 2381-1 Kitagejo, Fujii-cho, Nirasaki City, Yamanashi 407-8511, Japan.

Classifications MeSH