Narrow-band high-lying excitons with negative-mass electrons in monolayer WSe


Journal

Nature communications
ISSN: 2041-1723
Titre abrégé: Nat Commun
Pays: England
ID NLM: 101528555

Informations de publication

Date de publication:
17 Sep 2021
Historique:
received: 25 06 2021
accepted: 28 07 2021
entrez: 18 9 2021
pubmed: 19 9 2021
medline: 19 9 2021
Statut: epublish

Résumé

Monolayer transition-metal dichalcogenides (TMDCs) show a wealth of exciton physics. Here, we report the existence of a new excitonic species, the high-lying exciton (HX), in single-layer WSe

Identifiants

pubmed: 34535654
doi: 10.1038/s41467-021-25499-2
pii: 10.1038/s41467-021-25499-2
pmc: PMC8448890
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

5500

Subventions

Organisme : Deutsche Forschungsgemeinschaft (German Research Foundation)
ID : 314695032

Informations de copyright

© 2021. The Author(s).

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Auteurs

Kai-Qiang Lin (KQ)

Department of Physics, University of Regensburg, Regensburg, Germany. kaiqiang.lin@ur.de.

Chin Shen Ong (CS)

Department of Physics, University of California at Berkeley, Berkeley, CA, USA.
Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, CA, USA.

Sebastian Bange (S)

Department of Physics, University of Regensburg, Regensburg, Germany.

Paulo E Faria Junior (PE)

Department of Physics, University of Regensburg, Regensburg, Germany.

Bo Peng (B)

Cavendish Laboratory, University of Cambridge, Cambridge, UK.

Jonas D Ziegler (JD)

Department of Physics, University of Regensburg, Regensburg, Germany.

Jonas Zipfel (J)

Department of Physics, University of Regensburg, Regensburg, Germany.

Christian Bäuml (C)

Department of Physics, University of Regensburg, Regensburg, Germany.

Nicola Paradiso (N)

Department of Physics, University of Regensburg, Regensburg, Germany.

Kenji Watanabe (K)

Research Center for Functional Materials, National Institute for Materials Science, Tsukuba, Japan.

Takashi Taniguchi (T)

International Center for Materials Nanoarchitectonics, National Institute for Materials Science, Tsukuba, Japan.

Christoph Strunk (C)

Department of Physics, University of Regensburg, Regensburg, Germany.

Bartomeu Monserrat (B)

Cavendish Laboratory, University of Cambridge, Cambridge, UK.
Department of Materials Science and Metallurgy, University of Cambridge, Cambridge, UK.

Jaroslav Fabian (J)

Department of Physics, University of Regensburg, Regensburg, Germany.

Alexey Chernikov (A)

Department of Physics, University of Regensburg, Regensburg, Germany.
Dresden Integrated Center for Applied Physics and Photonic Materials (IAPP) and Würzburg-Dresden Cluster of Excellence ct.qmat, Technische Universität Dresden, Dresden, Germany.

Diana Y Qiu (DY)

Department of Physics, University of California at Berkeley, Berkeley, CA, USA.
Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, CA, USA.
Department of Mechanical Engineering and Materials Science, Yale University, Yale, CT, USA.

Steven G Louie (SG)

Department of Physics, University of California at Berkeley, Berkeley, CA, USA.
Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, CA, USA.

John M Lupton (JM)

Department of Physics, University of Regensburg, Regensburg, Germany. john.lupton@ur.de.

Classifications MeSH