Enhanced photoinduced mass migration in supramolecular azopolymers by H-bond driven positional constraint.


Journal

Journal of materials chemistry. C
ISSN: 2050-7526
Titre abrégé: J Mater Chem C Mater
Pays: England
ID NLM: 101601114

Informations de publication

Date de publication:
02 Sep 2021
Historique:
received: 17 05 2021
accepted: 15 07 2021
entrez: 1 10 2021
pubmed: 2 10 2021
medline: 2 10 2021
Statut: epublish

Résumé

Here we investigated the role of hydrogen bonding in the design of supramolecular azopolymers with a highly directional and constrained azobenzene-chain interaction involving the aromatic ring of the photoactive molecule, by exploiting the 2-aminopyrimidine/carboxylic acid supramolecular synthon as the tool for molecular recognition. We have shown that this approach is advantageous for producing affordable and versatile photopatternable azomaterials by complexation with polyacrylic acid (PAA). Molecular model complexes were successfully prepared and characterized by X-ray diffraction analysis and FTIR spectroscopy to reveal the multiple, non-ionic interaction occurring between the azobenzene units and the polymer chains. Surface photopatterning of thin films, driven by the typical mass migration phenomenon occurring in azopolymers, resulted strongly enhanced with increasing azobenzene content until equimolar composition. Results show that polymers with synthon-based azobenzenes markedly outperform single H-bonded systems bearing azomolecules with similar structure and electronic properties. We finally demonstrated that the azobenzene units can be easily extracted from a photopatterned film by a simple solvent rinse and without any chemical pre-treatment, leaving the periodicity of the inscribed surface relief gratings unaltered. This result was enabled by the orthogonal solubility of the components in the supramolecular system.

Identifiants

pubmed: 34594563
doi: 10.1039/d1tc02266k
pii: d1tc02266k
pmc: PMC8411878
doi:

Types de publication

Journal Article

Langues

eng

Pagination

11368-11375

Informations de copyright

This journal is © The Royal Society of Chemistry.

Déclaration de conflit d'intérêts

There are no conflicts to declare.

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Auteurs

Fabio Borbone (F)

Department of Chemical Sciences, University of Napoli Federico II, Complesso Universitario di Monte Sant'Angelo, Via Cintia Naples 80126 Italy fabio.borbone@unina.it.
CNST@POLIMI - Fondazione Istituto Italiano di Tecnologia, Via Pascoli 70 Milan 20133 Italy antonio.ambrosio@iit.it.

Stefano Luigi Oscurato (SL)

CNST@POLIMI - Fondazione Istituto Italiano di Tecnologia, Via Pascoli 70 Milan 20133 Italy antonio.ambrosio@iit.it.
Department of Physics E. Pancini, University of Napoli Federico II, Complesso Universitario di Monte Sant'Angelo, Via Cintia Naples 80126 Italy.

Salvatore Del Sorbo (S)

CNST@POLIMI - Fondazione Istituto Italiano di Tecnologia, Via Pascoli 70 Milan 20133 Italy antonio.ambrosio@iit.it.

Filippo Pota (F)

Department of Chemical Sciences, University of Napoli Federico II, Complesso Universitario di Monte Sant'Angelo, Via Cintia Naples 80126 Italy fabio.borbone@unina.it.

Marcella Salvatore (M)

Department of Physics E. Pancini, University of Napoli Federico II, Complesso Universitario di Monte Sant'Angelo, Via Cintia Naples 80126 Italy.

Francesco Reda (F)

Department of Physics E. Pancini, University of Napoli Federico II, Complesso Universitario di Monte Sant'Angelo, Via Cintia Naples 80126 Italy.

Pasqualino Maddalena (P)

CNST@POLIMI - Fondazione Istituto Italiano di Tecnologia, Via Pascoli 70 Milan 20133 Italy antonio.ambrosio@iit.it.
Department of Physics E. Pancini, University of Napoli Federico II, Complesso Universitario di Monte Sant'Angelo, Via Cintia Naples 80126 Italy.

Roberto Centore (R)

Department of Chemical Sciences, University of Napoli Federico II, Complesso Universitario di Monte Sant'Angelo, Via Cintia Naples 80126 Italy fabio.borbone@unina.it.

Antonio Ambrosio (A)

CNST@POLIMI - Fondazione Istituto Italiano di Tecnologia, Via Pascoli 70 Milan 20133 Italy antonio.ambrosio@iit.it.

Classifications MeSH