Ultrathin epitaxial Bi film growth on 2D HfTe

2D heterostructures ARPES Bi Xenes ambient air stability bismuthene epitaxy

Journal

Nanotechnology
ISSN: 1361-6528
Titre abrégé: Nanotechnology
Pays: England
ID NLM: 101241272

Informations de publication

Date de publication:
20 Oct 2021
Historique:
received: 12 07 2021
accepted: 05 10 2021
pubmed: 6 10 2021
medline: 6 10 2021
entrez: 5 10 2021
Statut: epublish

Résumé

Among ultrathin monoelemental two-dimensional (2D) materials, bismuthene, the single layer of heavier group-VΑ element bismuth (Bi), has been predicted to have large non trivial gap. Here, we demonstrate the growth of Bi films by molecular beam epitaxy on 2D-HfTe

Identifiants

pubmed: 34610589
doi: 10.1088/1361-6528/ac2d08
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Informations de copyright

© 2021 IOP Publishing Ltd.

Auteurs

Evangelia Xenogiannopoulou (E)

Institute of Nanoscience and Nanotechnology, National Center for Scientific Research 'Demokritos', 15310, Athens, Greece.

Dimitra Tsoutsou (D)

Institute of Nanoscience and Nanotechnology, National Center for Scientific Research 'Demokritos', 15310, Athens, Greece.

Polychronis Tsipas (P)

Institute of Nanoscience and Nanotechnology, National Center for Scientific Research 'Demokritos', 15310, Athens, Greece.

Sotirios Fragkos (S)

Institute of Nanoscience and Nanotechnology, National Center for Scientific Research 'Demokritos', 15310, Athens, Greece.
Department of Mechanical Engineering, University of West Attica, 12244, Athens, Greece.

Stefanos Chaitoglou (S)

Institute of Nanoscience and Nanotechnology, National Center for Scientific Research 'Demokritos', 15310, Athens, Greece.

Nikolaos Kelaidis (N)

Institute of Nanoscience and Nanotechnology, National Center for Scientific Research 'Demokritos', 15310, Athens, Greece.

Athanasios Dimoulas (A)

Institute of Nanoscience and Nanotechnology, National Center for Scientific Research 'Demokritos', 15310, Athens, Greece.

Classifications MeSH