Status and prospects of Ohmic contacts on two-dimensional semiconductors.

2D metal-semiconductor contact Fermi level pinning Ohmic contact Schottky barrier transferring electrode two-dimensional materials work function

Journal

Nanotechnology
ISSN: 1361-6528
Titre abrégé: Nanotechnology
Pays: England
ID NLM: 101241272

Informations de publication

Date de publication:
18 Nov 2021
Historique:
received: 17 04 2021
accepted: 14 10 2021
pubmed: 15 10 2021
medline: 15 10 2021
entrez: 14 10 2021
Statut: epublish

Résumé

In recent years, two-dimensional materials have received more and more attention in the development of semiconductor devices, and their practical applications in optoelectronic devices have also developed rapidly. However, there are still some factors that limit the performance of two-dimensional semiconductor material devices, and one of the most important is Ohmic contact. Here, we elaborate on a variety of approaches to achieve Ohmic contacts on two-dimensional materials and reveal their physical mechanisms. For the work function mismatch problem, we summarize the comparison of barrier heights between different metals and 2D semiconductors. We also examine different methods to solve the problem of Fermi level pinning. For the novel 2D metal-semiconductor contact methods, we analyse their effects on reducing contact resistance from two different perspectives: homojunction and heterojunction. Finally, the challenges of 2D semiconductors in achieving Ohmic contacts are outlined.

Identifiants

pubmed: 34649226
doi: 10.1088/1361-6528/ac2fe1
doi:

Types de publication

Journal Article Review

Langues

eng

Sous-ensembles de citation

IM

Informations de copyright

© 2021 IOP Publishing Ltd.

Auteurs

Junhao Ni (J)

Engineering Research Center of IoT Technology Applications (Ministry of Education), Department of Electronic Engineering, Jiangnan University, Wuxi 214122, People's Republic of China.

Quangui Fu (Q)

Engineering Research Center of IoT Technology Applications (Ministry of Education), Department of Electronic Engineering, Jiangnan University, Wuxi 214122, People's Republic of China.

Kostya Ken Ostrikov (KK)

School of Chemistry and Physics and QUT Centre for Materials Science, Queensland University of Technology (QUT), Brisbane QLD 4000, Australia.

Xiaofeng Gu (X)

Engineering Research Center of IoT Technology Applications (Ministry of Education), Department of Electronic Engineering, Jiangnan University, Wuxi 214122, People's Republic of China.

Haiyan Nan (H)

Engineering Research Center of IoT Technology Applications (Ministry of Education), Department of Electronic Engineering, Jiangnan University, Wuxi 214122, People's Republic of China.

Shaoqing Xiao (S)

Engineering Research Center of IoT Technology Applications (Ministry of Education), Department of Electronic Engineering, Jiangnan University, Wuxi 214122, People's Republic of China.

Classifications MeSH