Direct observation and manipulation of hot electrons at room temperature.

hot electrons photogating scanning photocurrent mapping valley transfer

Journal

National science review
ISSN: 2053-714X
Titre abrégé: Natl Sci Rev
Pays: China
ID NLM: 101633095

Informations de publication

Date de publication:
Sep 2021
Historique:
received: 29 09 2020
revised: 26 11 2020
accepted: 02 12 2020
entrez: 25 10 2021
pubmed: 26 10 2021
medline: 26 10 2021
Statut: epublish

Résumé

In modern electronics and optoelectronics, hot electron behaviors are highly concerned, as they determine the performance limit of a device or system, like the associated thermal or power constraint of chips and the Shockley-Queisser limit for solar cell efficiency. To date, however, the manipulation of hot electrons has been mostly based on conceptual interpretations rather than a direct observation. The problem arises from a fundamental fact that energy-differential electrons are mixed up in real-space, making it hard to distinguish them from each other by standard measurements. Here we demonstrate a distinct approach to artificially (spatially) separate hot electrons from cold ones in semiconductor nanowire transistors, which thus offers a unique opportunity to observe and modulate electron occupied state, energy, mobility and even path. Such a process is accomplished through the scanning-photocurrent-microscopy measurements by activating the intervalley-scattering events and 1D charge-neutrality rule. Findings here may provide a new degree of freedom in manipulating non-equilibrium electrons for both electronic and optoelectronic applications.

Identifiants

pubmed: 34691730
doi: 10.1093/nsr/nwaa295
pii: nwaa295
pmc: PMC8433094
doi:

Types de publication

Journal Article

Langues

eng

Pagination

nwaa295

Informations de copyright

© The Author(s) 2020. Published by Oxford University Press on behalf of China Science Publishing & Media Ltd.

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Auteurs

Hailu Wang (H)

State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China.

Fang Wang (F)

State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China.

Hui Xia (H)

State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China.

Peng Wang (P)

State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China.

Tianxin Li (T)

State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China.

Juzhu Li (J)

State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China.

Zhen Wang (Z)

State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China.

Jiamin Sun (J)

School of Microelectronics, Shandong University, Jinan 250100, China.

Peisong Wu (P)

State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China.

Jiafu Ye (J)

State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China.

Qiandong Zhuang (Q)

Department of Physics, Lancaster University, Lancaster LA1 4YB, UK.

Zaixing Yang (Z)

School of Microelectronics, Shandong University, Jinan 250100, China.

Lan Fu (L)

Department of Electronic Materials Engineering, Research School of Physics and Engineering, The Australian National University, Canberra, ACT 2601, Australia.

Weida Hu (W)

State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China.

Xiaoshuang Chen (X)

State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China.

Wei Lu (W)

State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China.

Classifications MeSH