Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO
Journal
The journal of physical chemistry. C, Nanomaterials and interfaces
ISSN: 1932-7447
Titre abrégé: J Phys Chem C Nanomater Interfaces
Pays: United States
ID NLM: 101299949
Informations de publication
Date de publication:
18 Nov 2021
18 Nov 2021
Historique:
received:
09
09
2021
revised:
26
10
2021
entrez:
26
11
2021
pubmed:
27
11
2021
medline:
27
11
2021
Statut:
ppublish
Résumé
An atmospheric-pressure plasma-enhanced spatial atomic layer deposition (PE-s-ALD) process for SiO
Identifiants
pubmed: 34824660
doi: 10.1021/acs.jpcc.1c07980
pmc: PMC8607820
doi:
Types de publication
Journal Article
Langues
eng
Pagination
24945-24957Informations de copyright
© 2021 The Authors. Published by American Chemical Society.
Déclaration de conflit d'intérêts
The authors declare no competing financial interest.
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