In Situ Analyses of Surface-Layer Composition of CxNy Thin Films Using Methods Based on Penning Ionization Processes-Introductory Investigations.
Penning ionization
carbonitride
electron energy distribution function
film diagnostics
thin films
Journal
Materials (Basel, Switzerland)
ISSN: 1996-1944
Titre abrégé: Materials (Basel)
Pays: Switzerland
ID NLM: 101555929
Informations de publication
Date de publication:
17 Dec 2021
17 Dec 2021
Historique:
received:
02
11
2021
revised:
02
12
2021
accepted:
13
12
2021
entrez:
24
12
2021
pubmed:
25
12
2021
medline:
25
12
2021
Statut:
epublish
Résumé
Carbon nitride materials have received much attention due to their excellent tribological, mechanical and optical properties. It was found that these qualities depend on the N/C ratio; therefore, the possibility to control it in situ in the sputtered film is of high importance. The plasma-electron spectroscopy method based on the Penning ionization process analysis is developed here to control this ratio in CN
Identifiants
pubmed: 34947406
pii: ma14247812
doi: 10.3390/ma14247812
pmc: PMC8707124
pii:
doi:
Types de publication
Journal Article
Langues
eng
Références
Nat Commun. 2020 Mar 13;11(1):1387
pubmed: 32170119
Adv Colloid Interface Sci. 2020 Sep;283:102229
pubmed: 32795670
Science. 2019 Jul 26;365(6451):360-366
pubmed: 31346061
Phys Rev B Condens Matter. 1990 May 15;41(15):10727-10734
pubmed: 9993481
Anal Chem. 2002 Nov 1;74(21):5556-63
pubmed: 12433088
Nat Mater. 2009 Jan;8(1):76-80
pubmed: 18997776