Metal-Induced Crystallization in Metal Oxides.


Journal

Accounts of chemical research
ISSN: 1520-4898
Titre abrégé: Acc Chem Res
Pays: United States
ID NLM: 0157313

Informations de publication

Date de publication:
18 Jan 2022
Historique:
pubmed: 4 1 2022
medline: 4 1 2022
entrez: 3 1 2022
Statut: ppublish

Résumé

ConspectusThe properties of a material depend upon its physical characteristics, one of these being its crystalline state. Next generation solid-state technologies will integrate crystalline oxides into thermal sensitive processes and composite materials. Crystallization of amorphous phases of metal oxides in the solid state typically requires substantial energy input to induce the amorphous to crystalline phase transformation. In the case of silica, the transformation to α-quartz in a furnace occurs above 1300 °C and that of titania, above 400 °C. These calcination processes are costly in energy but also often degrade complex material architectures or compositions.Thus, low temperature crystallization techniques are required that preserve macro- and mesostructures and complex elemental composition (e.g., organic-, metal-, and semiconductor-metal oxide hybrids/composites). Some solution-based techniques exist to directly fabricate crystalline metal oxides. However, these are not always compatible with the specificities of the system or industrial constraints. A postsynthetic, solid-state approach that reduces crystallization temperature in metal oxides is metal-induced crystallization (MIC).MIC is the introduction of catalytic amounts of a cation, which can be an s-block, p-block, or d-block cation, that migrates through the solid metal oxide lattice. The cation is thought to temporarily break metal oxide bonds, allowing [MO

Identifiants

pubmed: 34979086
doi: 10.1021/acs.accounts.1c00592
pmc: PMC8772270
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Pagination

171-185

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Auteurs

Laurent Lermusiaux (L)

Univ. Lyon, CNRS, École Normale Supérieure de Lyon, Laboratoire de Chimie, UMR 5182, 46 allée d'Italie, F-69007 Lyon, France.

Antoine Mazel (A)

CNRS, Univ. Bordeaux, Bordeaux INP, ICMCB, UMR 5026, F-33600 Pessac, France.

Adrian Carretero-Genevrier (A)

Institut d'Electronique et des Systèmes (IES), CNRS, Université de Montpellier, 860 Rue de Saint Priest, Montpellier 34095, France.

Clément Sanchez (C)

Laboratoire Chimie de la Matière Condensée, UMR 7574, Sorbonne Université-Collège de France-CNRS, 4 Place Jussieu, 75005 Paris, France.

Glenna L Drisko (GL)

CNRS, Univ. Bordeaux, Bordeaux INP, ICMCB, UMR 5026, F-33600 Pessac, France.

Classifications MeSH