Mechanisms of Ohmic Contact Formation of Ti/Al-Based Metal Stacks on p-Doped 4H-SiC.
4H-SiC
SIMS
Ti3SiC2
ohmic contact
simulation
Journal
Materials (Basel, Switzerland)
ISSN: 1996-1944
Titre abrégé: Materials (Basel)
Pays: Switzerland
ID NLM: 101555929
Informations de publication
Date de publication:
22 Dec 2021
22 Dec 2021
Historique:
received:
22
10
2021
revised:
15
12
2021
accepted:
16
12
2021
entrez:
11
1
2022
pubmed:
12
1
2022
medline:
12
1
2022
Statut:
epublish
Résumé
Ohmic contacts on p-doped 4H-SiC are essential for the fabrication of a wide range of power electron devices. Despite the fact that Ti/Al based ohmic contacts are routinely used for ohmic contacts on p-doped 4H-SiC, the underlying contact formation mechanisms are still not fully understood. TLM structures were fabricated, measured and analyzed to get a better understanding of the formation mechanism. SIMS analyses at the Ti
Identifiants
pubmed: 35009196
pii: ma15010050
doi: 10.3390/ma15010050
pmc: PMC8746140
pii:
doi:
Types de publication
Journal Article
Langues
eng