MoS

MoS2 cycle-to-cycle variability device-to-device variability interface-mediated memristor non-volatile synapse threshold logic gate

Journal

ACS nano
ISSN: 1936-086X
Titre abrégé: ACS Nano
Pays: United States
ID NLM: 101313589

Informations de publication

Date de publication:
22 02 2022
Historique:
pubmed: 11 2 2022
medline: 16 3 2022
entrez: 10 2 2022
Statut: ppublish

Résumé

Brain-inspired computing enabled by memristors has gained prominence over the years due to the nanoscale footprint and reduced complexity for implementing synapses and neurons. The demonstration of complex neuromorphic circuits using conventional materials systems has been limited by high cycle-to-cycle and device-to-device variability. Two-dimensional (2D) materials have been used to realize transparent, flexible, ultra-thin memristive synapses for neuromorphic computing, but with limited knowledge on the statistical variation of devices. In this work, we demonstrate ultra-low-variability synapses using chemical vapor deposited 2D MoS

Identifiants

pubmed: 35143159
doi: 10.1021/acsnano.1c09904
doi:

Substances chimiques

Molybdenum 81AH48963U

Types de publication

Journal Article Research Support, Non-U.S. Gov't Research Support, U.S. Gov't, Non-P.H.S.

Langues

eng

Sous-ensembles de citation

IM

Pagination

2866-2876

Auteurs

Adithi Krishnaprasad (A)

NanoScience Technology Center, University of Central Florida, Orlando, Florida 32826, United States.
Department of Electrical and Computer Engineering, University of Central Florida, Orlando, Florida 32816, United States.

Durjoy Dev (D)

NanoScience Technology Center, University of Central Florida, Orlando, Florida 32826, United States.
Department of Electrical and Computer Engineering, University of Central Florida, Orlando, Florida 32816, United States.

Sang Sub Han (SS)

NanoScience Technology Center, University of Central Florida, Orlando, Florida 32826, United States.
Department of Electrical and Computer Engineering, University of Central Florida, Orlando, Florida 32816, United States.

Yaqing Shen (Y)

Institute of Functional Nano & Soft Materials, Soochow University, Suzhou 215123, China.

Hee-Suk Chung (HS)

Analytical Research Division, Korea Basic Science Institute, Jeonju, Jeollabuk-do 54907, South Korea.

Tae-Sung Bae (TS)

Analytical Research Division, Korea Basic Science Institute, Jeonju, Jeollabuk-do 54907, South Korea.

Changhyeon Yoo (C)

NanoScience Technology Center, University of Central Florida, Orlando, Florida 32826, United States.

Yeonwoong Jung (Y)

NanoScience Technology Center, University of Central Florida, Orlando, Florida 32826, United States.
Department of Electrical and Computer Engineering, University of Central Florida, Orlando, Florida 32816, United States.
Department of Materials Science and Engineering, University of Central Florida, Orlando, Florida 32816, United States.

Mario Lanza (M)

Department of Material Science and Engineering, King Abdullah University of Science and Technology, Thuwal 23955, Saudi Arabia.

Tania Roy (T)

NanoScience Technology Center, University of Central Florida, Orlando, Florida 32826, United States.
Department of Electrical and Computer Engineering, University of Central Florida, Orlando, Florida 32816, United States.
Department of Materials Science and Engineering, University of Central Florida, Orlando, Florida 32816, United States.

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Classifications MeSH