Study of Structural and Optical Properties of Electrodeposited Silicon Films on Graphite Substrates.
Si nanowire
SiO2
electrochemical reduction
graphite substrate
microstructural properties
Journal
Nanomaterials (Basel, Switzerland)
ISSN: 2079-4991
Titre abrégé: Nanomaterials (Basel)
Pays: Switzerland
ID NLM: 101610216
Informations de publication
Date de publication:
24 Jan 2022
24 Jan 2022
Historique:
received:
29
11
2021
revised:
13
01
2022
accepted:
20
01
2022
entrez:
15
2
2022
pubmed:
16
2
2022
medline:
16
2
2022
Statut:
epublish
Résumé
Silicon (Si) films were deposited on low-cost graphite substrates by the electrochemical reduction of silicon dioxide nanoparticles (nano-SiO
Identifiants
pubmed: 35159708
pii: nano12030363
doi: 10.3390/nano12030363
pmc: PMC8840187
pii:
doi:
Types de publication
Journal Article
Langues
eng
Subventions
Organisme : Tsukuba Industry-Academia Collaboration Strengthening Project.
ID : N/A
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