Crystallization and Electrical Properties of Ge-Rich GeSbTe Alloys.

Ge-rich alloys crystallization temperature electrical properties segregation

Journal

Nanomaterials (Basel, Switzerland)
ISSN: 2079-4991
Titre abrégé: Nanomaterials (Basel)
Pays: Switzerland
ID NLM: 101610216

Informations de publication

Date de publication:
14 Feb 2022
Historique:
received: 29 12 2021
revised: 31 01 2022
accepted: 08 02 2022
entrez: 26 2 2022
pubmed: 27 2 2022
medline: 27 2 2022
Statut: epublish

Résumé

Enrichment of GeSbTe alloys with germanium has been proposed as a valid approach to increase the crystallization temperature and therefore to address high-temperature applications of non-volatile phase change memories, such as embedded or automotive applications. However, the tendency of Ge-rich GeSbTe alloys to decompose with the segregation of pure Ge still calls for investigations on the basic mechanisms leading to element diffusion and compositional variations. With the purpose of identifying some possible routes to limit the Ge segregation, in this study, we investigate Ge-rich Sb

Identifiants

pubmed: 35214960
pii: nano12040631
doi: 10.3390/nano12040631
pmc: PMC8876497
pii:
doi:

Types de publication

Journal Article

Langues

eng

Subventions

Organisme : European Union
ID : 824957
Organisme : European Union
ID : 823717

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Auteurs

Stefano Cecchi (S)

Paul-Drude-Institut für Festkörperelektronik, Leibniz-Institut im Forschungsverbund Berlin e.V., Hausvogteiplatz 5-7, 10117 Berlin, Germany.
Department of Materials Science, University of Milano-Bicocca, via R. Cozzi 55, 20125 Milano, Italy.

Iñaki Lopez Garcia (I)

Institute for Microelectronic and Microsystems (IMM), National Research Council (CNR), Zona Industriale Ottava Strada 5, 95121 Catania, Italy.

Antonio M Mio (AM)

Institute for Microelectronic and Microsystems (IMM), National Research Council (CNR), Zona Industriale Ottava Strada 5, 95121 Catania, Italy.

Eugenio Zallo (E)

Paul-Drude-Institut für Festkörperelektronik, Leibniz-Institut im Forschungsverbund Berlin e.V., Hausvogteiplatz 5-7, 10117 Berlin, Germany.
Walter Schottky Institut, Physik Department, Technische Universität München, Am Coulombwall 4, 85748 Garching, Germany.

Omar Abou El Kheir (O)

Department of Materials Science, University of Milano-Bicocca, via R. Cozzi 55, 20125 Milano, Italy.

Raffaella Calarco (R)

Paul-Drude-Institut für Festkörperelektronik, Leibniz-Institut im Forschungsverbund Berlin e.V., Hausvogteiplatz 5-7, 10117 Berlin, Germany.
Institute for Microelectronic and Microsystems (IMM), National Research Council (CNR), Via del Fosso del Cavaliere 100, 00133 Roma, Italy.

Marco Bernasconi (M)

Department of Materials Science, University of Milano-Bicocca, via R. Cozzi 55, 20125 Milano, Italy.

Giuseppe Nicotra (G)

Institute for Microelectronic and Microsystems (IMM), National Research Council (CNR), Zona Industriale Ottava Strada 5, 95121 Catania, Italy.

Stefania M S Privitera (SMS)

Institute for Microelectronic and Microsystems (IMM), National Research Council (CNR), Zona Industriale Ottava Strada 5, 95121 Catania, Italy.

Classifications MeSH