Raman study of silicon telluride nanoplates and their degradation.

Raman spectroscopy degradation silicon telluride

Journal

Nanotechnology
ISSN: 1361-6528
Titre abrégé: Nanotechnology
Pays: England
ID NLM: 101241272

Informations de publication

Date de publication:
07 Apr 2022
Historique:
received: 16 11 2021
accepted: 09 03 2022
pubmed: 10 3 2022
medline: 10 3 2022
entrez: 9 3 2022
Statut: epublish

Résumé

Silicon telluride (Si

Identifiants

DOI: 10.1088/1361-6528/ac5c13 PMID: 35263725
pubmed: 35263725
doi: 10.1088/1361-6528/ac5c13
doi:

Types de publication

Journal Article

Langues

eng

Sous-ensembles de citation

IM

Informations de copyright

© 2022 IOP Publishing Ltd.

Auteurs

Evan Hathaway (E)

Department of Physics, University of North Texas, Denton, TX 76203, United States of America.

Jiyang Chen (J)

Department of Physics and Material Science, University of Memphis, Memphis, TN 38152, United States of America.

Roberto Gonzalez-Rodriguez (R)

Department of Physics, University of North Texas, Denton, TX 76203, United States of America.
ORCID: 0000-0001-6849-1799

Yuankun Lin (Y)

Department of Physics, University of North Texas, Denton, TX 76203, United States of America.

Jingbiao Cui (J)

Department of Physics, University of North Texas, Denton, TX 76203, United States of America.
ORCID: 0000-0003-3408-1016

Classifications MeSH